H01J 37/32293
Using particular waveforms
Official title: {using particular waveforms, e.g. polarised waves}
H01J37/32293 (Using particular waveforms) appears on 46 US grants and 47 published applications in this corpus.
Search patents in H01J- Granted patents
- 46
- Published applications
- 47
- Assignees
- 23
- Inventors
- 130
- Latest grant
- 4 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 2 |
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 2 | 2 |
| 2006 | 1 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 2 |
| 2011 | 1 | 0 |
| 2012 | 0 | 2 |
| 2013 | 0 | 4 |
| 2014 | 0 | 2 |
| 2015 | 3 | 0 |
| 2016 | 0 | 6 |
| 2017 | 3 | 2 |
| 2018 | 2 | 2 |
| 2019 | 2 | 4 |
| 2020 | 1 | 5 |
| 2021 | 5 | 2 |
| 2022 | 2 | 2 |
| 2023 | 2 | 1 |
| 2024 | 5 | 4 |
| 2025 | 4 | 3 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Artificial diamond plasma production device10 Sep 2024US 12,084,759 B2Wave Power Technology Inc.
- Plasma processing apparatus and plasma processing method11 Jun 2026US 2026/0162940 A1Hitachi High-Tech Corporation
- Adaptive engine for tracking and regulation control using a control law selector and combiner13 Nov 2025US 2025/0348046 A1Advanced Energy Industries, Inc.
- Plasma processing apparatus and heating apparatus10 Apr 2025US 2025/0118537 A1Hitachi High-Tech Corporation
- Plasma processing method6 Mar 2025US 2025/0079136 A1Hitachi High-Tech Corporation
- Plasma processing apparatus5 Sep 2024US 2024/0297020 A1Tokyo Electron Limited
Most cited
By later US patents
- Silicon scavenger in an inductively coupled RF plasma reactor249US 5,556,501 AAPPLIED Materials.Inc. · 1996
- Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion183US 9,072,158 B2Tokyo Electron Limited · 2015
- Plasma etch processes84US 6,251,792 B1APPLIED Materials.Inc. · 2001
- Process and apparatus for plasma CVD coating or plasma treating substrates77US 5,250,328 ASchott Glaswerke · 1993
- Method for processing substrates using gaseous silicon scavenger70US 6,444,137 B1APPLIED Materials.Inc. · 2002