Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsTaro Ikeda, Yuki Osada, Hiroyuki Miyashita
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AssigneeTokyo Electron Limited
InventorsTaro Ikeda, Yuki Osada, Hiroyuki Miyashita
Estimating the term…
A plasma processing apparatus includes: a processing container; a resonator configured to resonate electromagnetic waves to be supplied; a slot antenna connected to the resonator; and a transmission window configured to transmit the electromagnetic waves radiated from the slot antenna and supply the electromagnetic waves into the processing container, wherein the resonator includes: an input port including an inner shaft and an outer cylinder; an output port including an inner shaft and an outer cylinder; a power supply fin connecting the inner shaft of the input port and the inner shaft of the output port and provided in the resonator; and a ground fin connected to the outer cylinder of the input port and the outer cylinder of the output port at a same potential and provided to protrude within the resonator so as to be inserted between fins of the power supply fin.
A plasma processing apparatus, comprising:
Dependencies are inferred from the claim text.