US 6,271,148 B1 · Method for improved remote microwave plasma source for use with substrate processing system

Abstract

An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.

Claims26

Dependent claims

A method for plasma processing using an apparatus having a conductive plasma applicator, the method comprising:

introducing said one or more reactive gases at a first rate to a gas inlet of the plasma applicator during a first time period at a first flow rate;
directing microwaves into an internal volume of the applicator during said first time period to ignite a plasma in said applicator;
and
permitting radicals generated by the plasma to exit from the applicator through an outlet while containing the microwaves within the applicator.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

09/416,861Filed 13 Oct 1999 · continuation

Priority

23 Apr 1997

Granted

7 Aug 2001

Term ends

Not estimatedThe source records don’t support an estimate.

Classification10 codes

C23C 16/52
Characterised by the method of coating: controlling or regulating the coating process
C23C 16/4405
Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber: cleaning of reactor or parts inside the reactor by…
C23C 16/452
Characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials: by activating…
H01J 37/32192
Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources: microwave generated discharge

Method for improved remote microwave plasma source for use with substrate processing system

Life of this patent

Method for improved remote microwave plasma source for use with substrate processing system

Life of this patent

Abstract

Claims26