H01J 37/32302
Plural frequencies
Official title: {Plural frequencies}
H01J37/32302 (Plural frequencies) appears on 48 US grants and 57 published applications in this corpus.
Search patents in H01J- Granted patents
- 48
- Published applications
- 57
- Assignees
- 20
- Inventors
- 105
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 2 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 2 | 4 |
| 2005 | 1 | 2 |
| 2006 | 2 | 3 |
| 2007 | 3 | 2 |
| 2008 | 1 | 0 |
| 2009 | 3 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 2 |
| 2014 | 0 | 3 |
| 2015 | 1 | 5 |
| 2016 | 3 | 2 |
| 2017 | 2 | 6 |
| 2018 | 5 | 8 |
| 2019 | 6 | 3 |
| 2020 | 7 | 4 |
| 2021 | 3 | 1 |
| 2022 | 0 | 1 |
| 2023 | 2 | 1 |
| 2024 | 0 | 0 |
| 2025 | 1 | 5 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Modification method and modification device6 Oct 2026US 12,755,941 B2Tokyo Electron Limited
- Plasma processing method and plasma processing apparatus24 Jun 2025US 12,338,532 B2Tokyo Electron Limited
- Near-field microwave heating system and method26 Sep 2023US 11,766,833 B2Expert Tooling and Automation, Ltd.
- Near-field microwave heating system and method25 Apr 2023US 11,633,922 B2Expert Tooling and Automation, Ltd.
- Microwave output device and plasma processing device8 Jun 2021US 11,031,213 B2Tokyo Electron Limited
- Passivating microwave dielectrics for semiconductor manufacturing18 Jun 2026US 2026/0171364 A1APPLIED Materials.Inc.
- Power supply assembly for generating a plasma, and plasma process system19 Mar 2026US 2026/0081109 A1Trumpf HüTtinger GmbH + Co. KG
- Dynamic frequency tuning for microwave power amplifiers2 Oct 2025US 2025/0308852 A1APPLIED Materials.Inc.
- Substrate processing method and substrate processing apparatus25 Sep 2025US 2025/0299924 A1Tokyo Electron Limited
- Heating device and substrate treating apparatus including the same19 Jun 2025US 2025/0201531 A1Semes Co., Ltd.
Most cited
By later US patents
- Method for deposition of a conformal layer on a substrate290US 6,194,038 B1APPLIED Materials.Inc. · 2001
- Radial waveguide systems and methods for post-match control of microwaves157US 9,299,537 B2APPLIED Materials.Inc. · 2016
- Radial waveguide systems and methods for post-match control of microwaves153US 9,299,538 B2APPLIED Materials.Inc. · 2016
- Radial waveguide systems and methods for post-match control of microwaves129US 9,564,296 B2APPLIED Materials.Inc. · 2017
- Radial waveguide systems and methods for post-match control of microwaves111US 9,837,249 B2APPLIED Materials.Inc. · 2017