Heating device and substrate treating apparatus including the same

A heating device comprising:

• a plurality of microwave generating modules generating a plurality of microwaves;
• a waveguide guiding the plurality of microwaves to a space in which the substrate is treated;
• and
• a control module controlling an operation of each microwave generating module, wherein the substrate is heated using the plurality of microwaves by an apparatus for treating the substrate by using plasma, and
• the plurality of microwaves are different from each other in at least one component of power, frequency or phase.

A substrate treating apparatus comprising:

• a chamber housing providing a space in which a substrate is treated;
• a substrate support unit supporting the substrate inside the chamber housing;
• a showerhead unit providing a process gas into the chamber housing;
• a plasma generating unit generating plasma for treating the substrate inside the chamber housing by using the process gas;
• and
• a heating device heating the substrate by using a plurality of electromagnetic waves,
• wherein the heating device includes:
• a plurality of microwave generating modules generating the plurality of microwaves;
• a waveguide guiding the plurality of microwaves to the space in which the substrate is treated;
• a temperature measurement module including a plurality of temperature sensors and measuring a surface temperature of each zone of the substrate;
• and
• a control module controlling an operation of each microwave generating module and each temperature sensor,
• wherein the plurality of microwaves are different from each other in at least one component of power, frequency or phase, and
• the control module heats the substrate while the substrate is being treated, and selectively heats the substrate based on the surface temperature of each zone of the substrate.