H01J 37/32201
Generating means
Official title: {Generating means}
H01J37/32201 (Generating means) appears on 124 US grants and 184 published applications in this corpus.
Search patents in H01J- Granted patents
- 124
- Published applications
- 184
- Assignees
- 65
- Inventors
- 407
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 2 |
| 2007 | 0 | 3 |
| 2008 | 0 | 2 |
| 2009 | 3 | 0 |
| 2010 | 2 | 1 |
| 2011 | 1 | 1 |
| 2012 | 1 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 7 |
| 2015 | 1 | 11 |
| 2016 | 6 | 5 |
| 2017 | 9 | 8 |
| 2018 | 4 | 17 |
| 2019 | 6 | 18 |
| 2020 | 20 | 17 |
| 2021 | 12 | 17 |
| 2022 | 13 | 13 |
| 2023 | 9 | 15 |
| 2024 | 13 | 13 |
| 2025 | 7 | 15 |
| 2026 | 12 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Modification method and modification device6 Oct 2026US 12,755,941 B2Tokyo Electron Limited
- Plasma showerhead assembly and method of reducing defects29 Sep 2026US 12,747,502 B2APPLIED Materials.Inc.
- Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows25 Aug 2026US 12,719,024 B26K Inc.
- PEALD titanium nitride with direct microwave plasma18 Aug 2026US 12,712,155 B2APPLIED Materials.Inc.
- Modular high-frequency source23 Jun 2026US 12,665,169 B2APPLIED Materials.Inc.
- Cleaning method and plasma processing apparatus24 Sep 2026US 2026/0290765 A1Tokyo Electron Limited
- Plasma measurement method and plasma measurement system17 Sep 2026US 2026/0279747 A1Tokyo Electron Limited
- Microwave plasma generating apparatus, microwave plasma processing apparatus, and microwave plasma processing method27 Aug 2026US 2026/0253841 A1Abit Technologies Co., Ltd
- Plasma Processing Device23 Jul 2026US 2026/0213132 A1Tokyo Electron Limited
- Discharge and Modulation System and Method for Microwave-Radio Frequency (RF) Mixed Coupled Plasma23 Jul 2026US 2026/0214780 A1
Most cited
By later US patents
- Radial waveguide systems and methods for post-match control of microwaves157US 9,299,537 B2APPLIED Materials.Inc. · 2016
- Radial waveguide systems and methods for post-match control of microwaves153US 9,299,538 B2APPLIED Materials.Inc. · 2016
- Radial waveguide systems and methods for post-match control of microwaves129US 9,564,296 B2APPLIED Materials.Inc. · 2017
- Radial waveguide systems and methods for post-match control of microwaves111US 9,837,249 B2APPLIED Materials.Inc. · 2017
- Method and apparatus for producing plasma97US 7,589,470 B2Dublin City University · 2009