H01J 37/32211
Means for coupling power to the plasma
Official title: {Means for coupling power to the plasma}
H01J37/32211 (Means for coupling power to the plasma) appears on 793 US grants and 872 published applications in this corpus.
Search patents in H01J- Granted patents
- 793
- Published applications
- 872
- Assignees
- 285
- Inventors
- 1,693
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 5 | 0 |
| 1986 | 5 | 0 |
| 1987 | 4 | 0 |
| 1988 | 7 | 0 |
| 1989 | 3 | 0 |
| 1990 | 8 | 0 |
| 1991 | 13 | 0 |
| 1992 | 15 | 0 |
| 1993 | 21 | 0 |
| 1994 | 20 | 0 |
| 1995 | 16 | 0 |
| 1996 | 22 | 0 |
| 1997 | 19 | 0 |
| 1998 | 14 | 0 |
| 1999 | 15 | 0 |
| 2000 | 16 | 0 |
| 2001 | 18 | 7 |
| 2002 | 13 | 14 |
| 2003 | 7 | 12 |
| 2004 | 16 | 24 |
| 2005 | 11 | 22 |
| 2006 | 6 | 21 |
| 2007 | 11 | 28 |
| 2008 | 9 | 16 |
| 2009 | 13 | 27 |
| 2010 | 14 | 24 |
| 2011 | 13 | 30 |
| 2012 | 15 | 30 |
| 2013 | 10 | 41 |
| 2014 | 26 | 42 |
| 2015 | 22 | 58 |
| 2016 | 39 | 32 |
| 2017 | 36 | 42 |
| 2018 | 30 | 46 |
| 2019 | 34 | 43 |
| 2020 | 46 | 45 |
| 2021 | 33 | 48 |
| 2022 | 31 | 42 |
| 2023 | 24 | 53 |
| 2024 | 46 | 47 |
| 2025 | 42 | 43 |
| 2026 | 21 | 35 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Plasma processing apparatus6 Oct 2026US 12,755,939 B2Tokyo Electron Limited
- Plasma showerhead assembly and method of reducing defects29 Sep 2026US 12,747,502 B2APPLIED Materials.Inc.
- Plasma processing apparatus22 Sep 2026US 12,744,187 B2Tokyo Electron Limited
- Antenna unit and substrate treating apparatus including the same4 Aug 2026US 12,701,649 B2Semes Co., Ltd.
- Plasma processing apparatus21 Jul 2026US 12,689,004 B2The University of Shiga Prefecture
- Monolithic modular high-frequency plasma source1 Oct 2026US 2026/0302134 A1APPLIED Materials.Inc.
- Microwave System for Microwave-Assisted Surface Chemistry Annealing of ALD Processes Utilizing Microwave Radiation Energy10 Sep 2026US 2026/0265912 A1MKS Inc.
- Apparatus and method for cleaning susceptors with plasma10 Sep 2026US 2026/0269198 A1APPLIED Materials.Inc.
- Microwave plasma cvd device27 Aug 2026US 2026/0253840 A1National Institute of Advanced Industrial Science and Technology
- In situ cleaning of deposition chamber with microwave plasma13 Aug 2026US 2026/0234792 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Processing apparatus and method for plasma processing739US 5,134,965 AHitachi, Ltd. · 1992
- Plasma processing method and film forming method509US 7,771,796 B2Tokyo Electron Limited · 2010
- Microwave plasma reactor467US 5,501,740 AApplied Science and Technology, Inc. · 1996
- Plasma processing apparatus435US 5,698,036 ATokyo Electron Limited · 1997
- Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber400US 5,226,967 ALam Research Corporation · 1993