H01J 37/32247
Resonators
Official title: {Resonators}
H01J37/32247 (Resonators) appears on 152 US grants and 158 published applications in this corpus.
Search patents in H01J- Granted patents
- 152
- Published applications
- 158
- Assignees
- 91
- Inventors
- 424
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 4 | 0 |
| 1992 | 4 | 0 |
| 1993 | 6 | 0 |
| 1994 | 7 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 0 |
| 2002 | 4 | 6 |
| 2003 | 1 | 1 |
| 2004 | 0 | 2 |
| 2005 | 2 | 6 |
| 2006 | 1 | 2 |
| 2007 | 2 | 2 |
| 2008 | 0 | 1 |
| 2009 | 1 | 2 |
| 2010 | 0 | 2 |
| 2011 | 1 | 4 |
| 2012 | 5 | 2 |
| 2013 | 0 | 15 |
| 2014 | 5 | 6 |
| 2015 | 3 | 4 |
| 2016 | 9 | 4 |
| 2017 | 7 | 11 |
| 2018 | 5 | 8 |
| 2019 | 3 | 4 |
| 2020 | 6 | 7 |
| 2021 | 7 | 10 |
| 2022 | 8 | 4 |
| 2023 | 5 | 10 |
| 2024 | 6 | 18 |
| 2025 | 12 | 15 |
| 2026 | 7 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Plasma processing apparatus6 Oct 2026US 12,755,939 B2Tokyo Electron Limited
- Plasma processing apparatus22 Sep 2026US 12,744,187 B2Tokyo Electron Limited
- Plasma processing apparatus21 Jul 2026US 12,689,004 B2The University of Shiga Prefecture
- Treatment chamber with modular microwave power delivery30 Jun 2026US 12,671,061 B2APPLIED Materials.Inc.
- Modular microwave plasma source9 Jun 2026US 12,651,727 B2APPLIED Materials.Inc.
- Apparatus and method for cleaning susceptors with plasma10 Sep 2026US 2026/0269198 A1APPLIED Materials.Inc.
- Microwave plasma cvd device27 Aug 2026US 2026/0253840 A1National Institute of Advanced Industrial Science and Technology
- In situ cleaning of deposition chamber with microwave plasma13 Aug 2026US 2026/0234792 A1APPLIED Materials.Inc.
- Plasma Processing Device23 Jul 2026US 2026/0213132 A1Tokyo Electron Limited
- Discharge and Modulation System and Method for Microwave-Radio Frequency (RF) Mixed Coupled Plasma23 Jul 2026US 2026/0214780 A1
Most cited
By later US patents
- Processing apparatus and method for plasma processing739US 5,134,965 AHitachi, Ltd. · 1992
- Apparatus and method for efficient and compact remote microwave plasma generation392US 6,029,602 AAPPLIED Materials.Inc. · 2000
- Plasma processing method and apparatus283US 6,158,383 AHitachi, Ltd. · 2000
- Ion generating apparatus and method for the use thereof115US 4,507,588 ABoard of Trustees operating Michigan State University · 1985
- Method and apparatus for producing high density plasma using whistler mode excitation110US 5,225,740 AGeneral Atomics · 1993