Apparatus and method for cleaning susceptors with plasma
AssigneeApplied Materials, Inc.
InventorsTHAI CHENG CHUA, MARCUS HERNANDEZ, HAO-CHUN KAO, ADAM FISCHBACH, CHRISTIAN VALENCIA, RUSSELL CHIN YEE TEO
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Abstract
Embodiments described herein relate to an apparatus that includes a chamber, and a lid that is configured to seal the chamber. In an embodiment, the lid includes a dielectric faceplate, and a plurality of dielectric resonators coupled to the dielectric faceplate. In an embodiment, the plurality of dielectric resonators are arranged in a ring-like pattern. In an embodiment, a gas line passes through the lid, and the gas line is within an inner perimeter of the ring-like pattern.
Claims20
An apparatus, comprising:
- a chamber;
- a lid that is configured to seal the chamber, wherein the lid comprises:
- a dielectric faceplate;
- and
- a plurality of dielectric resonators coupled to the dielectric faceplate, wherein the plurality of dielectric resonators are arranged in a ring-like pattern;
- and
- a gas line through the lid, wherein the gas line is within an inner perimeter of the ring-like pattern.
A semiconductor processing tool, comprising:
- a transfer chamber;
- a first chamber coupled to the transfer chamber, wherein the first chamber is configured to deposit a layer on a substrate that is supported by a susceptor;
- and
- a second chamber coupled to the transfer chamber, wherein the second chamber is configured to clean the susceptor with a plasma that is localized over an outer region of the susceptor.
A chamber lid, comprising:
- a dielectric faceplate with a plurality of openings, wherein the plurality of openings are arranged in a ring-like pattern;
- a shield on a surface of the dielectric faceplate, wherein the shield has an outer surface that is inside the ring-like pattern;
- and
- a gas line that passes through the dielectric faceplate, wherein the gas line is inside an outer perimeter of the shield.
Dependencies are inferred from the claim text.