Plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber configured to provide a processing space;
• an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation supplied to the processing space;
• a dielectric provided with a first surface facing the processing space;
• and
• an electromagnetic wave supply portion configured to supply the electromagnetic waves to the processing space through the dielectric,
• wherein the dielectric includes:
• a cell serving as a plasma generation space on the first surface side of the dielectric,
• a plurality of grooves formed on a second surface opposite to the first surface, the grooves surrounding the cell without communicating with the cell;
• and
• a plurality of resonators including C-shaped ring members made of conductors inserted into the plurality of grooves, wherein the resonators are formed as a part of the dielectric, and the resonators are capable of resonating with magnetic field components of the electromagnetic waves and have a size smaller than a wavelength of the electromagnetic wave.