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US 6,158,383 AGranted
Plasma processing method and apparatus
AssigneeHitachi, Ltd.
InventorsSeiichi Watanabe, Muneo Furuse, Hitoshi Tamura, Toru Otsubo
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Abstract
In a plasma processing method and apparatus, microwaves are radiated from a slot antenna set at the bottom of a resonator, a plasma is generated using the microwave and a sample is processed by the plasma. A plasma having a ring-form is generated by the microwaves radiated from the slot antennas, which are disposed at an angle which is neither in parallel to nor perpendicular to a surface current flowing on a slot antenna plate. Thereby, the sample is uniformly processed.
Claims8
A plasma processing apparatus comprising:
- a microwave source;
- a microwave waveguide for transmitting microwaves radiated from said microwave source;
- a ring-shaped cavity resonator for resonating the microwaves transmitted by said microwave waveguide;
- a processing chamber including a sample stand for placing thereon a substrate to be treated;
- and
- microwave electromagnetic field radiating means for radiating a microwave electromagnetic field from said ring-shaped cavity resonator through a microwave introduction window into said precessing chamber, to generate a ring-shaped plasma in a region opposed to said substrate.
3 more elements
Dependencies are inferred from the claim text.