Plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber having a processing space;
• an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation to be supplied to the processing space;
• a dielectric having a first surface facing the processing space;
• an electromagnetic wave supply connected to an RF power supply and configured to supply the electromagnetic waves to the processing space via the dielectric;
• and
• a resonator array structure disposed along the first surface of the dielectric in the processing chamber,
• wherein the resonator array structure includes a plurality of resonators resonating with magnetic field components of the electromagnetic waves, having a size smaller than a wavelength of the electromagnetic waves, and arranged in a direction along the first surface of the dielectric,
• the electromagnetic wave supply is configured to supply magnetic field components perpendicular to a plane on which the plurality of resonators are arranged, and
• the electromagnetic wave supply is a coil disposed outside the processing chamber and wound in a planar spiral shape.