H01J 37/32238
Windows
Official title: {Windows}
H01J37/32238 (Windows) appears on 180 US grants and 231 published applications in this corpus.
Search patents in H01J- Granted patents
- 180
- Published applications
- 231
- Assignees
- 65
- Inventors
- 532
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 3 | 0 |
| 1993 | 3 | 0 |
| 1994 | 6 | 0 |
| 1995 | 6 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 5 | 0 |
| 1999 | 5 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 3 |
| 2002 | 2 | 4 |
| 2003 | 0 | 3 |
| 2004 | 4 | 3 |
| 2005 | 2 | 5 |
| 2006 | 1 | 3 |
| 2007 | 1 | 9 |
| 2008 | 2 | 4 |
| 2009 | 1 | 8 |
| 2010 | 5 | 6 |
| 2011 | 4 | 8 |
| 2012 | 3 | 4 |
| 2013 | 2 | 9 |
| 2014 | 5 | 9 |
| 2015 | 7 | 16 |
| 2016 | 7 | 7 |
| 2017 | 5 | 15 |
| 2018 | 9 | 12 |
| 2019 | 8 | 14 |
| 2020 | 14 | 7 |
| 2021 | 9 | 14 |
| 2022 | 7 | 7 |
| 2023 | 4 | 19 |
| 2024 | 10 | 18 |
| 2025 | 15 | 8 |
| 2026 | 6 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma processing apparatus22 Sep 2026US 12,744,187 B2Tokyo Electron Limited
- Plasma processing apparatus21 Jul 2026US 12,689,004 B2The University of Shiga Prefecture
- Monolithic modular high-frequency plasma source7 Jul 2026US 12,676,289 B2APPLIED Materials.Inc.
- Substrate treating apparatus and substrate treating method23 Jun 2026US 12,665,170 B2Semes Co., Ltd.
- Plasma processing apparatus5 May 2026US 12,620,556 B2Hitachi High-Tech Corporation
- Monolithic modular high-frequency plasma source1 Oct 2026US 2026/0302134 A1APPLIED Materials.Inc.
- Microwave plasma cvd device27 Aug 2026US 2026/0253840 A1National Institute of Advanced Industrial Science and Technology
- Plasma Processing Device and Plasma Measuring Method2 Jul 2026US 2026/0188631 A1Tokyo Electron Limited
- Substrate treating apparatus18 Jun 2026US 2026/0171362 A1Samsung Electronics Co., Ltd.
- Plasma processing apparatus and plasma processing method18 Jun 2026US 2026/0171363 A1Tokyo Electron Limited
Most cited
By later US patents
- Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber400US 5,226,967 ALam Research Corporation · 1993
- Window for microwave plasma processing device400US 5,234,526 ALam Research Corporation · 1993
- ECR plasma source for remote processing242US 5,451,259 A1995
- Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window114US 5,368,710 ALam Research Corporation · 1994
- Plasma processing apparatus86US 5,342,472 ATokyo Electron Limited · 1994