Plasma Processing Device and Plasma Measuring Method

A plasma processing apparatus comprising:

• a processing chamber providing a processing space;
• an electromagnetic wave generator configured to generate plasma in the processing space by supplying electromagnetic waves;
• a first dielectric body having a first surface facing the processing space;
• an electromagnetic wave supply part configured to supply the electromagnetic waves to the processing space via the first dielectric body;
• and
• a resonator array structure located in the processing chamber along the first surface of the first dielectric body,
• wherein the resonator array structure includes a plurality of resonators that are capable of resonating with a magnetic field component of the electromagnetic waves and have a size smaller than a wavelength of the electromagnetic waves,
• the plurality of resonators has a structure in which C-shaped ring members made of a conductor are provided on one surface of a dielectric plate, and
• at least one of the C-shaped ring members serves as a probe for measuring information on the plasma.