Plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber in which a sample is subjected to plasma processing, including, at an upper side therein, a dielectric plate through which a microwave is transmitted;
• a radio frequency power supply which supplies radio frequency power for the microwave;
• a cavity resonator which resonates the microwave transmitted from the radio frequency power supply through a waveguide and is placed above the dielectric plate;
• a magnetic field forming mechanism which forms a magnetic field in the processing chamber;
• a ring-shaped conductor disposed inside the cavity resonator;
• and
• a circular conductor which is disposed inside the cavity resonator in an opening formed at a center of the ring-shaped conductor,
• wherein the ring-shaped conductor and the circular conductor are constructed to form a slot disposed therebetween,
• wherein the circular conductor is configured to be independently moveable with respect to the ring-shaped conductor, and
• wherein the circular conductor has a convex tapered shape that fits to a concave tapered shape formed in the dielectric plate.