Back to results
US 12,676,289 B2Granted
Monolithic modular high-frequency plasma source
AssigneeApplied Materials, Inc.
InventorsThai Cheng Chua, Philip Allan Kraus
Life of this patent
Estimating the term…
Abstract
Embodiments disclosed herein include a monolithic source array. In an embodiment, the monolithic source array comprises a dielectric plate having a first surface and a second surface opposite from the first surface. The monolithic source array may further comprise a plurality of protrusions that extend out from the first surface of the dielectric plate, wherein the plurality of protrusions and the dielectric plate are a monolithic structure.
Claims9
A monolithic source array, comprising:
- a dielectric plate having a first surface and a second surface opposite from the first surface;
- a plurality of protrusions that extend out from the first surface of the dielectric plate, wherein the plurality of protrusions and the dielectric plate are a monolithic structure, wherein a cross-section of each protrusion along a plane parallel to the first surface is circular and has a same area, and wherein each protrusion has a hole extending partially through a center of the protrusion;
- and
- a conductive layer conformal with the plurality of protrusions, wherein the conductive layer has a plurality of openings therein, and wherein each of the plurality of openings in the conductive layer exposes a corresponding one of the holes in the plurality of protrusions.
1 more element
Dependencies are inferred from the claim text.