US 5,234,526 A · Window for microwave plasma processing device

Abstract

A microwave transmitting window for a plasma processing device. The window is a body of one or more pieces of the same or different dielectric materials. A surface of the window facing a microwave transmitting horn or waveguide is planar and extends perpendicularly to an axial direction. An opposite surface of the window is recessed such that the body has a non-uniform thickness between the two surfaces. The recessed surface can have various shapes and the overall size of the window can be equal to the size of a plasma formation chamber of the plasma processing device. The outlet of the plasma formation chamber can be formed in an end wall or the outlet can be formed by the inner periphery of the plasma formation chamber.

Claims37

Dependent claims

A microwave plasma processing device including a plasma generation chamber which generates plasma by exciting electron cyclotron resonance using microwaves introduced through a microwave lead-in opening in an end wall of the plasma formation chamber, the microwave lead-in opening having a cross section smaller than a cross section of the plasma formation chamber, the microwave plasma processing device including a microwave-penetrable substance on a side of the plasma generation chamber facing the microwave lead-in opening, the microwave-penetrable substance extending over an entire cross-section of the chamber, the microwave-penetrable substance having a thickness between a surface thereof facing an interior of the plasma generation chamber and another surface opposite thereto, the thickness becoming greater in a direction from a center of the plasma generation chamber to a periphery thereof.

A plasma generating device, comprising:

a plasma formation chamber having first and second ends thereof spaced apart in an axial direction, a first opening in the first end for passing microwave energy into the plasma formation chamber and a second opening in the second end for passing plasma outwardly of the plasma formation chamber;
a reaction chamber adjacent the second end of the plasma formation chamber, the reaction chamber including a substrate support aligned in the axial direction with the second opening;
and
a microwave transmitting window sealing the first opening, the window comprising a body of dielectric material, the body including first and second surfaces spaced apart in the axial direction, the body including an outer periphery extending between the first and second surfaces, the first surface being planar and extending perpendicularly to the axial direction, and the second surface being recessed such that the body has a non-uniform thickness between the first and second surfaces, the thickness increasing in a direction towards the outer periphery of the body.

1 more element

Dependencies are inferred from the claim text.

Window for microwave plasma processing device

Life of this patent

Window for microwave plasma processing device

Life of this patent

Abstract

Claims37