Plasma processing apparatus
AssigneesTokyo Electron Limited, Naohisa Goto, Makoto Ando, Junichi Takada, Yasuhiro Horike
InventorsNobuo Ishii, Yasuo Kobayashi, Naohisa Goto, Makoto Ando, Junichi Takada, Yasuhiro Horike
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Abstract
A plasma processing apparatus comprises a processing container, a waveguide tube for guiding microwaves generated by a microwave generator, and a flat antenna member connected to the wave guide and disposed in the container to face a semiconductor wafer supported in the container. The antenna includes a plurality of short slits concentrically or spirally arranged in the antenna. The slits are spaced apart in the widthwise direction at intervals of 5% to 50% of a guide wavelength of the microwave, and each of the slits has a length of +30% of the guide wavelength centered with respect to half of the guide wavelength.
Claims24
A plasma processing apparatus comprising:
- a processing container;
- support means disposed in said processing container, supporting a member to be processed which has a surface to be processed;
- a microwave generator for generating microwaves;
- a waveguide tube for guiding microwaves generated by said microwave generator into said processing container;
- a flat antenna member electrically connected to said waveguide tube, facing, apart for an interval, said surface of said member to be processed, which is supported by said support means, and disposed to define a plasma forming region between said flat antenna member and said surface of said member to be processed;
- and
- means for supplying processing gas to said plasma forming region,
- said antenna member including a conductive plate and a multiplicity of slits formed in the conductive plate, the distribution and dimensions of slits being set so that an electrostatic field exponentially attenuating with the distance from said antenna member, is formed in said plasma forming region to generate plasma of said processing gas in said plasma forming region.
A plasma processing apparatus comprising:
- a processing container;
- support means disposed in said processing container, for supporting a member to be processed which has a surface to be processed;
- a microwave generator for generating microwaves;
- a waveguide tube for guiding microwaves generated by said microwave generator into said processing container and a plurality of branched waveguide tubes branched from said waveguide tube;
- and
- a flat antenna member electrically connected to said waveguide tube, facing, apart for an interval, said surface of said member to be processed, which is supported by said support means, and disposed to define a plasma forming region between said flat antenna member and said surface of said member to be processed,
- said antenna member including a conductive plate and a multiplicity of slits formed in the conductive plate, the distribution and dimensions of slits being set so that an electrostatic field exponentially attenuating with the distance from said antenna member, is formed in said plasma forming region to generate plasma of said processing gas in said plasma forming region.
Dependencies are inferred from the claim text.