Antenna unit and substrate treating apparatus including the same

Abstract

An antenna unit having a slot structure capable of achieving maximum emission efficiency and a substrate treating apparatus including the antenna unit are provided. The substrate treating apparatus includes: a chamber housing; a substrate support unit supporting a substrate; a showerhead unit providing a process gas, which is for treating the substrate, onto the substrate; a plasma generation unit including a high-frequency power source and generating plasma in an internal space of the chamber housing using the process gas and power provided by the high-frequency power source; and an antenna unit connected to the high-frequency power source and operating as an electrode for generating the plasma, wherein the antenna unit includes a plurality of slot pairs, which are formed in a slot plate, and the slot pairs are arranged radially from a central region of the slot plate.

Dependencies are inferred from the claim text.