H01J 37/32229
Waveguides
Official title: {Waveguides}
H01J37/32229 (Waveguides) appears on 299 US grants and 316 published applications in this corpus.
Search patents in H01J- Granted patents
- 299
- Published applications
- 316
- Assignees
- 135
- Inventors
- 713
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 4 | 0 |
| 1991 | 3 | 0 |
| 1992 | 4 | 0 |
| 1993 | 7 | 0 |
| 1994 | 8 | 0 |
| 1995 | 5 | 0 |
| 1996 | 10 | 0 |
| 1997 | 10 | 0 |
| 1998 | 10 | 0 |
| 1999 | 9 | 0 |
| 2000 | 5 | 0 |
| 2001 | 6 | 1 |
| 2002 | 1 | 3 |
| 2003 | 4 | 1 |
| 2004 | 3 | 4 |
| 2005 | 3 | 5 |
| 2006 | 1 | 2 |
| 2007 | 0 | 8 |
| 2008 | 2 | 6 |
| 2009 | 3 | 5 |
| 2010 | 5 | 7 |
| 2011 | 3 | 9 |
| 2012 | 4 | 8 |
| 2013 | 4 | 8 |
| 2014 | 6 | 23 |
| 2015 | 7 | 23 |
| 2016 | 18 | 9 |
| 2017 | 17 | 13 |
| 2018 | 10 | 20 |
| 2019 | 14 | 25 |
| 2020 | 26 | 23 |
| 2021 | 15 | 20 |
| 2022 | 12 | 18 |
| 2023 | 12 | 17 |
| 2024 | 20 | 16 |
| 2025 | 15 | 24 |
| 2026 | 7 | 18 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma processing apparatus6 Oct 2026US 12,755,939 B2Tokyo Electron Limited
- Substrate treating apparatus and substrate treating method23 Jun 2026US 12,665,170 B2Semes Co., Ltd.
- Electromagnetic wave supply mechanism and plasma processing apparatus26 May 2026US 12,640,347 B2Tokyo Electron Limited
- Microwave system for microwave-assisted surface chemistry annealing of ALD processes utilizing microwave radiation energy19 May 2026US 12,630,922 B2MKS Inc.
- Plasma processing apparatus5 May 2026US 12,620,556 B2Hitachi High-Tech Corporation
- Microwave System for Microwave-Assisted Surface Chemistry Annealing of ALD Processes Utilizing Microwave Radiation Energy10 Sep 2026US 2026/0265912 A1MKS Inc.
- Microwave plasma cvd device27 Aug 2026US 2026/0253840 A1National Institute of Advanced Industrial Science and Technology
- Plasma processing apparatus and plasma processing method18 Jun 2026US 2026/0171363 A1Tokyo Electron Limited
- A microwave plasma reactor with a plurality of emitters and absorbers and a method for plasma processing a workpiece using such a microwave plasma reactor18 Jun 2026US 2026/0171365 A1
- Plasma processing apparatus and plasma generation method11 Jun 2026US 2026/0162937 A1Tokyo Electron Limited
Most cited
By later US patents
- Plasma processing apparatus435US 5,698,036 ATokyo Electron Limited · 1997
- Guided wave applicator with non-gaseous dielectric for plasma chamber191US 9,397,380 B2APPLIED Materials.Inc. · 2016
- Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion183US 9,072,158 B2Tokyo Electron Limited · 2015
- Radial waveguide systems and methods for post-match control of microwaves157US 9,299,537 B2APPLIED Materials.Inc. · 2016
- Radial waveguide systems and methods for post-match control of microwaves153US 9,299,538 B2APPLIED Materials.Inc. · 2016