Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorMitsutoshi Ashida
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AssigneeTokyo Electron Limited
InventorMitsutoshi Ashida
Estimating the term…
A plasma processing apparatus is provided in one exemplary embodiment. A microwave output device of the plasma processing apparatus is configured to output microwaves that are provided into a chamber, and a controller is configured to control the operation of the microwave output device. The microwaves outputted by the microwave output device include an output wave for transmitting a power used for plasma generation, and a broadband sweep wave group used for detection of a plasma state. In the microwave output device, a modulator modulates the microwaves and transmits the modulated microwaves to a waveguide, and a demodulator receives and demodulates a reflected wave group obtained by the sweep wave group being reflected by plasma in the chamber. The controller is configured to determine a frequency of the output wave based on the reflected wave group, and control the microwave output device to output the output wave of the frequency.
A plasma processing apparatus comprising:
A plasma processing apparatus comprising:
A plasma processing apparatus comprising:
Dependencies are inferred from the claim text.