H01J 37/32348
Dielectric barrier discharge
Official title: {Dielectric barrier discharge}
H01J37/32348 (Dielectric barrier discharge) appears on 227 US grants and 327 published applications in this corpus.
Search patents in H01J- Granted patents
- 227
- Published applications
- 327
- Assignees
- 180
- Inventors
- 614
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 3 |
| 2003 | 2 | 2 |
| 2004 | 3 | 9 |
| 2005 | 1 | 4 |
| 2006 | 2 | 12 |
| 2007 | 2 | 5 |
| 2008 | 0 | 12 |
| 2009 | 3 | 2 |
| 2010 | 7 | 16 |
| 2011 | 5 | 9 |
| 2012 | 9 | 9 |
| 2013 | 9 | 14 |
| 2014 | 6 | 12 |
| 2015 | 8 | 22 |
| 2016 | 17 | 15 |
| 2017 | 7 | 16 |
| 2018 | 9 | 20 |
| 2019 | 23 | 17 |
| 2020 | 15 | 23 |
| 2021 | 17 | 24 |
| 2022 | 14 | 20 |
| 2023 | 19 | 21 |
| 2024 | 15 | 19 |
| 2025 | 19 | 11 |
| 2026 | 8 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Surface modification method15 Sep 2026US 12,738,465 B2Sekisui Chemical Co., Ltd.
- Apparatus for treating substrate and method for treating substrate1 Sep 2026US 12,725,765 B2Psk Inc.
- Plasma treatment apparatus and method using same16 Jun 2026US 12,653,917 B2Plasmapp Co., Ltd.
- Remote surface wave propagation for semiconductor chambers5 May 2026US 12,620,553 B2APPLIED Materials.Inc.
- Atomic layer deposition and vapor deposition reactor with in-chamber microplasma source3 Mar 2026US 12,565,703 B2The Board of Trustees of the University of Illinois
- Remote Surface Wave Propagation for Semiconductor Chamber13 Aug 2026US 2026/0237603 A1APPLIED Materials.Inc.
- Magnetically enhanced resistive and dielectric barrier discharge9 Jul 2026US 2026/0196440 A1APPLIED Materials.Inc.
- Gas analysis device and control method25 Jun 2026US 2026/0179892 A1Atonarp Inc.
- Plasma generator and substrate processing apparatus including the same11 Jun 2026US 2026/0162936 A1Samsung Electronics Co., Ltd.
- Systems for and methods of improved plasma enhanced deposition, surface modification, and abatement30 Apr 2026US 2026/0120993 A1Stellar Engiine, Inc.
Most cited
By later US patents
- High voltage resistive output stage circuit84US 10,460,910 B2Eagle Harbor Technologies, Inc. · 2019
- High voltage resistive output stage circuit82US 10,483,089 B2Eagle Harbor Technologies, Inc. · 2019
- Plasma reactor for the treatment of large size substrates77US 6,228,438 B1Unakis Balzers Aktiengesellschaft · 2001
- Efficient nanosecond pulser with source and sink capability for plasma control applications71US 10,796,887 B2Eagle Harbor Technologies, Inc. · 2020
- High voltage resistive output stage circuit69US 10,460,911 B2Eagle Harbor Technologies, Inc. · 2019