Magnetically enhanced resistive and dielectric barrier discharge
AssigneeApplied Materials, Inc.
InventorsYogananda SARODE VISHWANATH, John POULOSE
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Abstract
The present disclosure provides a substrate processing chamber configured to produce an inductively coupled plasma. In one example, the substrate processing chamber includes a chamber body, a substrate support assembly disposed within the chamber body, a lid assembly enclosing a processing region within the chamber body, the lid assembly comprising an inductive coil configured to generate a plasma within the processing region of the chamber body, at least one magnet coupled to a magnet power source, and at least one electrode circumferentially extending along a perimeter of the chamber body. The at least one electrode is positioned below a metal lid support ring and above the at least one magnet.
Claims20
A substrate processing chamber, comprising:
- a chamber body;
- a substrate support assembly disposed within the chamber body;
- a lid assembly enclosing a processing region within the chamber body, the lid assembly comprising an inductive coil configured to generate a plasma within the processing region of the chamber body;
- at least one magnet coupled to a magnet power source;
- and
- a plurality of electrodes positioned in a radial pattern within a metal ring, wherein the plurality of electrodes are placed above the at least one magnet.
A substrate processing chamber, comprising:
- a chamber body;
- a substrate support assembly disposed within the chamber body;
- a lid assembly enclosing a processing region within the chamber body, the lid assembly comprising an inductive coil configured to generate a plasma within the processing region of the chamber body;
- at least one magnet coupled to a magnet power source;
- and
- a single electrode positioned within a metal ring to circumferentially extend along a perimeter of the chamber body, wherein the single electrode is placed above the at least one magnet.
A method, comprising:
- forming a substrate support assembly within a chamber body;
- disposing a lid assembly enclosing a processing region within the chamber body, the lid assembly comprising an inductive coil configured to generate a plasma within the processing region of the chamber body;
- placing at least one magnet adjacent the chamber body;
- and
- positioning at least one electrode within a metal ring to circumferentially extend along a perimeter of the chamber body.
Dependencies are inferred from the claim text.