H01J 37/32018
Glow discharge
Official title: {Glow discharge}
H01J37/32018 (Glow discharge) appears on 433 US grants and 434 published applications in this corpus.
Search patents in H01J- Granted patents
- 433
- Published applications
- 434
- Assignees
- 228
- Inventors
- 991
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 4 | 0 |
| 1979 | 1 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 7 | 0 |
| 1983 | 5 | 0 |
| 1984 | 3 | 0 |
| 1985 | 6 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 2 | 0 |
| 1990 | 6 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 4 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 5 | 0 |
| 1999 | 14 | 0 |
| 2000 | 7 | 0 |
| 2001 | 6 | 3 |
| 2002 | 6 | 5 |
| 2003 | 1 | 4 |
| 2004 | 4 | 3 |
| 2005 | 7 | 5 |
| 2006 | 4 | 13 |
| 2007 | 2 | 6 |
| 2008 | 4 | 19 |
| 2009 | 6 | 23 |
| 2010 | 4 | 26 |
| 2011 | 14 | 16 |
| 2012 | 9 | 10 |
| 2013 | 17 | 17 |
| 2014 | 19 | 25 |
| 2015 | 23 | 36 |
| 2016 | 22 | 23 |
| 2017 | 13 | 21 |
| 2018 | 20 | 25 |
| 2019 | 22 | 23 |
| 2020 | 26 | 33 |
| 2021 | 22 | 23 |
| 2022 | 20 | 17 |
| 2023 | 22 | 18 |
| 2024 | 24 | 21 |
| 2025 | 14 | 11 |
| 2026 | 8 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- High power generator and method of supplying high power pulses16 Jun 2026US 12,658,714 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses16 Jun 2026US 12,658,715 B2Trumpf Huettinger Sp. Z O. O.
- Visualization device and related systems and methods5 May 2026US 12,621,547 B2Boston Scientific Scimed, Inc.
- Electrode filament connection member, chemical vapor deposition apparatus, and method for manufacturing recording medium substrate21 Apr 2026US 12,606,914 B2Resonac Hard Disk Corporation
- Multicell or multiarray plasma and method for surface treatment using the same14 Apr 2026US 12,603,250 B2Institut SystèMes Industriels, Haute Ecole De Suisse Occidentale, Valais-Wallis (Hes-So)
- Real Time Radical Output Monitoring Using Optical Emission Spectroscopy3 Sep 2026US 2026/0260860 A1MKS Inc.
- System and method for a double-sided atmospheric plasma head13 Aug 2026US 2026/0237602 A1Ontos Equipment Systems, Inc.
- Plasma processing apparatus23 Jul 2026US 2026/0213131 A1Tokyo Electron Limited
- High power generator, pulsing arrangement, and method of supplying a plasma process with high power pulses2 Jul 2026US 2026/0188616 A1Trumpf Huettinger Sp. Z O. O.
- Dc bias in plasma process30 Apr 2026US 2026/0120995 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Plasma process apparatus391US 5,478,429 ATokyo Electron Limited · 1995
- Microwave enhanced CVD system under magnetic field373US 5,512,102 ASemiconductor Energy Laboratory Co.Ltd. · 1996
- Microwave enhanced CVD system under magnetic field359US 6,230,650 B1Semiconductor Energy Laboratory Co.Ltd. · 2001
- Polarity control for remote plasma184US 9,117,855 B2APPLIED Materials.Inc. · 2015
- Treatment method in glow-discharge plasma and apparatus thereof117US 5,968,377 ASekisui Chemical Co., Ltd. · 1999