H01J 37/32027
Dc powered
Official title: {DC powered}
H01J37/32027 (Dc powered) appears on 172 US grants and 196 published applications in this corpus.
Search patents in H01J- Granted patents
- 172
- Published applications
- 196
- Assignees
- 84
- Inventors
- 436
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 3 | 0 |
| 1999 | 6 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 3 |
| 2002 | 3 | 2 |
| 2003 | 1 | 0 |
| 2004 | 1 | 1 |
| 2005 | 1 | 3 |
| 2006 | 2 | 6 |
| 2007 | 0 | 2 |
| 2008 | 3 | 10 |
| 2009 | 1 | 12 |
| 2010 | 1 | 8 |
| 2011 | 7 | 5 |
| 2012 | 4 | 2 |
| 2013 | 5 | 2 |
| 2014 | 2 | 7 |
| 2015 | 11 | 15 |
| 2016 | 9 | 10 |
| 2017 | 8 | 9 |
| 2018 | 4 | 13 |
| 2019 | 11 | 12 |
| 2020 | 12 | 19 |
| 2021 | 14 | 8 |
| 2022 | 9 | 9 |
| 2023 | 14 | 11 |
| 2024 | 15 | 15 |
| 2025 | 6 | 7 |
| 2026 | 3 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- High power generator and method of supplying high power pulses16 Jun 2026US 12,658,714 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses16 Jun 2026US 12,658,715 B2Trumpf Huettinger Sp. Z O. O.
- Multicell or multiarray plasma and method for surface treatment using the same14 Apr 2026US 12,603,250 B2Institut SystèMes Industriels, Haute Ecole De Suisse Occidentale, Valais-Wallis (Hes-So)
- Plasma generation device and control method therefor18 Nov 2025US 12,476,078 B2En2Core Technology, Inc.
- Plasma processing apparatus and method14 Oct 2025US 12,444,580 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Plasma processing apparatus23 Jul 2026US 2026/0213131 A1Tokyo Electron Limited
- High power generator, pulsing arrangement, and method of supplying a plasma process with high power pulses2 Jul 2026US 2026/0188616 A1Trumpf Huettinger Sp. Z O. O.
- Dc bias in plasma process30 Apr 2026US 2026/0120995 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Plasma processing method and plasma processing apparatus23 Apr 2026US 2026/0112576 A1Samsung Electronics Co., Ltd.
- Plasma generation device and control method therefor12 Feb 2026US 2026/0045448 A1En2Core Technology, Inc.
Most cited
By later US patents
- Treatment method in glow-discharge plasma and apparatus thereof117US 5,968,377 ASekisui Chemical Co., Ltd. · 1999
- Low frequency, pulsed, bipolar power supply for a plasma chamber105US 5,303,139 AMagtron Magneto Elektronische Gerate GmbH · 1994
- Electric supply unit for plasma installations99US 6,621,674 B1Hüttinger Elektronik GmbH & Co. KG · 2003
- System for tunable workpiece biasing in a plasma reactor89US 10,373,804 B2APPLIED Materials.Inc. · 2019
- Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages77US 9,520,269 B2Advanced Energy Industries, Inc. · 2016