Plasma generation device and control method therefor
AssigneeEn2Core Technology, Inc.
InventorsSae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Abstract
According to one embodiment of the present specification, there can be provided an apparatus for generating plasma, comprising: a chamber configured to provide a generating space for the plasma; an antenna module placed adjacent to the chamber and configured to be connected to a first power source and generate induced electric field in the chamber; an electrode placed adjacent to the chamber and configured to be connected to a second power source and assist in a generation of the plasma; a sensor configured to obtain sensing information related to a status of the plasma; and a controller configured to control the first power source and the second power source.
Claims11
An apparatus for generating plasma, comprising:
- a chamber configured to provide a space for generating plasma;
- a first power source configured to output RF voltage;
- a second power source configured to output pulsed DC voltage;
- an antenna module disposed to surround an outer surface of a side wall of the chamber,
- wherein the antenna module is electrically connected to the first power source, and
- wherein the antenna module is configured to induce an electromagnetic field inside the chamber by receiving the RF voltage from the first power source;
- an electrode disposed adjacent to the chamber,
- wherein the electrode is electrically connected to the second power source, and
- wherein the electrode is configured to supply electrons inside the chamber by receiving the DC voltage from the second power source;
- a sensor configured to obtain electrical information,
- wherein the electrical information is related to plasma ignition inside the chamber;
- and
- a controller configured to obtain the electrical information from the sensor and control the first power source and the second power source based on the obtained electrical information,
- wherein the controller is configured to control the first power source to apply the RF voltage to the antenna module during a first duration and to control the second power source to apply the pulsed DC voltage to the electrode during a second duration, and the first duration being overlapped with at least a part of the second duration,
- wherein the controller is configured, at a first time point, to determine whether plasma ignition has occurred or not based on the electrical information,
- wherein:
- the controller is configured to maintain the application of the RF voltage and the pulsed DC voltage, when a result of the determination indicates that plasma ignition has not occurred, or
- the controller is configured to control the second power source not to apply the pulsed DC voltage to the electrode while controlling the first power source to apply the RF voltage to the antenna module, when a result of the determination indicates that plasma ignition has occurred, and
- wherein the first time point is included in the first duration.
Dependencies are inferred from the claim text.