H01J 37/32045
Circuits specially adapted for controlling the glow discharge
Official title: {Circuits specially adapted for controlling the glow discharge}
H01J37/32045 (Circuits specially adapted for controlling the glow discharge) appears on 103 US grants and 103 published applications in this corpus.
Search patents in H01J- Granted patents
- 103
- Published applications
- 103
- Assignees
- 57
- Inventors
- 218
- Latest grant
- 10 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 4 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 1 |
| 2007 | 1 | 2 |
| 2008 | 1 | 6 |
| 2009 | 2 | 12 |
| 2010 | 1 | 14 |
| 2011 | 8 | 1 |
| 2012 | 3 | 3 |
| 2013 | 9 | 7 |
| 2014 | 8 | 3 |
| 2015 | 7 | 8 |
| 2016 | 4 | 6 |
| 2017 | 0 | 2 |
| 2018 | 5 | 4 |
| 2019 | 7 | 6 |
| 2020 | 4 | 4 |
| 2021 | 4 | 8 |
| 2022 | 6 | 2 |
| 2023 | 8 | 6 |
| 2024 | 8 | 4 |
| 2025 | 2 | 1 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Inter-period control system for plasma power delivery system and method of operating same10 Mar 2026US 12,573,591 B2Advanced Energy Industries, Inc.
- Control circuit for drivers, switching unit and system, power supply, and plasma system17 Feb 2026US 12,557,206 B2TRUMPF Huettinger GmbH + Co. KG
- Plasma generation device and control method therefor18 Nov 2025US 12,476,078 B2En2Core Technology, Inc.
- Glow plasma stabilization15 Jul 2025US 12,362,140 B2Servomex Group Limited
- Atomic layer etching by electron wavefront15 Oct 2024US 12,119,205 B2Velvetch LLC
- Plasma generation device and control method therefor12 Feb 2026US 2026/0045448 A1En2Core Technology, Inc.
- Energy refeeding module, switching circuit and embodiment, plasma processing system, and a method of producing rectangular voltage output pulses for a plasma processing load26 Jun 2025US 2025/0210306 A1
- Composite stage for electron enhanced material processing17 Oct 2024US 2024/0347323 A1Velvetch LLC
- Control circuit for drivers, switching unit and system, power supply, and plasma system15 Aug 2024US 2024/0276629 A1TRUMPF Huettinger GmbH + Co. KG
- Atomic layer etching by electron wavefront25 Jul 2024US 2024/0249913 A1Velvetch LLC
Most cited
By later US patents
- Plasma process apparatus391US 5,478,429 ATokyo Electron Limited · 1995
- Treatment method in glow-discharge plasma and apparatus thereof117US 5,968,377 ASekisui Chemical Co., Ltd. · 1999
- Method and apparatus for controlling ion energy distribution115US 9,287,092 B2Advanced Energy Industries, Inc. · 2016
- Low frequency, pulsed, bipolar power supply for a plasma chamber105US 5,303,139 AMagtron Magneto Elektronische Gerate GmbH · 1994
- Plasma supply device96US 8,129,653 B2HUETTINGER Elektronik GmbH + Co. KG · 2012