H01J 37/32036
Ac powered
Official title: {AC powered}
H01J37/32036 (Ac powered) appears on 67 US grants and 83 published applications in this corpus.
Search patents in H01J- Granted patents
- 67
- Published applications
- 83
- Assignees
- 56
- Inventors
- 182
- Latest grant
- 21 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 0 |
| 2005 | 2 | 1 |
| 2006 | 0 | 2 |
| 2007 | 0 | 0 |
| 2008 | 1 | 3 |
| 2009 | 1 | 1 |
| 2010 | 0 | 3 |
| 2011 | 2 | 5 |
| 2012 | 0 | 2 |
| 2013 | 0 | 3 |
| 2014 | 5 | 8 |
| 2015 | 5 | 12 |
| 2016 | 6 | 5 |
| 2017 | 1 | 3 |
| 2018 | 5 | 7 |
| 2019 | 8 | 3 |
| 2020 | 8 | 7 |
| 2021 | 5 | 3 |
| 2022 | 4 | 5 |
| 2023 | 2 | 3 |
| 2024 | 4 | 2 |
| 2025 | 2 | 3 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electrode filament connection member, chemical vapor deposition apparatus, and method for manufacturing recording medium substrate21 Apr 2026US 12,606,914 B2Resonac Hard Disk Corporation
- Atomic layer deposition and vapor deposition reactor with in-chamber microplasma source3 Mar 2026US 12,565,703 B2The Board of Trustees of the University of Illinois
- Apparatus for edge control during plasma processing16 Dec 2025US 12,500,067 B2Tokyo Electron Limited
- Process and device for diamond synthesis by CVD18 Feb 2025US 12,227,834 B2Diarotech S.A.
- Charged particle emission device, system, method, and program26 Nov 2024US 12,154,762 B2National University Corporation, Iwate University
- Apparatus for edge control during plasma processing12 Mar 2026US 2026/0074152 A1Tokyo Electron Limited
- Film forming device and method for forming carbon film11 Sep 2025US 2025/0283222 A1Resonac Hard Disk Corporation
- Electrode filament connection member, chemical vapor deposition apparatus, and method for manufacturing recording medium substrate29 May 2025US 2025/0171903 A1Resonac Hard Disk Corporation
- Process and device for diamond synthesis by cvd10 Apr 2025US 2025/0115991 A1Diarotech S.A.
- Methods and Apparatus for Delivering Feedstocks for Plasma Treatment25 Jan 2024US 2024/0024840 A1Haydale Graphene Industries PLC
Most cited
By later US patents
- Polarity control for remote plasma184US 9,117,855 B2APPLIED Materials.Inc. · 2015
- Controlling multiple plasma processes42US 10,971,342 B2Trumpf Huettinger Sp. Z O. O. · 2021
- Method for generating and maintaining a glow plasma discharge34US 6,005,349 AThe Trustees of the Stevens Institute of Technology · 1999
- A.C. plasma processing system32US 5,882,492 ASierra Applied Sciences, Inc. · 1999
- Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition32US 8,652,586 B2Agc Flat Glass North America, Inc. · 2014