Apparatus for edge control during plasma processing

Abstract

A focus ring includes an insulating material having an annular shape that defines an interior opening. The focus ring further includes a conductive structure embedded within the insulating material. The conductive structure is configured to generate a plasma localized along the annular shape and surrounding the interior opening. The conductive structure may be configured to generate the plasma using alternating current power indirectly coupled to the conductive structure through the insulating material. The conductive structure may include a capacitive structure and an inductive structure, which may both be fully encased in the insulating material. The capacitive structure and the inductive structure may together form a resonant inductor-capacitor circuit comprising a resonant frequency greater than 30 MHz.

Dependencies are inferred from the claim text.