H01J 37/32082
Radio frequency generated discharge
Official title: {Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence)}
H01J37/32082 (Radio frequency generated discharge) appears on 7,273 US grants and 9,207 published applications in this corpus.
Search patents in H01J- Granted patents
- 7,273
- Published applications
- 9,207
- Assignees
- 1,065
- Inventors
- 10,718
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 4 | 0 |
| 1981 | 11 | 0 |
| 1982 | 8 | 0 |
| 1983 | 4 | 0 |
| 1984 | 5 | 0 |
| 1985 | 5 | 0 |
| 1986 | 16 | 0 |
| 1987 | 10 | 0 |
| 1988 | 8 | 0 |
| 1989 | 23 | 0 |
| 1990 | 18 | 0 |
| 1991 | 13 | 0 |
| 1992 | 14 | 0 |
| 1993 | 34 | 0 |
| 1994 | 42 | 0 |
| 1995 | 59 | 0 |
| 1996 | 55 | 0 |
| 1997 | 60 | 0 |
| 1998 | 85 | 0 |
| 1999 | 111 | 0 |
| 2000 | 174 | 0 |
| 2001 | 193 | 74 |
| 2002 | 205 | 183 |
| 2003 | 153 | 216 |
| 2004 | 169 | 270 |
| 2005 | 113 | 247 |
| 2006 | 127 | 216 |
| 2007 | 102 | 263 |
| 2008 | 94 | 217 |
| 2009 | 106 | 255 |
| 2010 | 161 | 254 |
| 2011 | 132 | 265 |
| 2012 | 176 | 239 |
| 2013 | 190 | 274 |
| 2014 | 209 | 335 |
| 2015 | 245 | 415 |
| 2016 | 310 | 390 |
| 2017 | 324 | 444 |
| 2018 | 320 | 387 |
| 2019 | 397 | 459 |
| 2020 | 412 | 525 |
| 2021 | 356 | 511 |
| 2022 | 378 | 586 |
| 2023 | 336 | 616 |
| 2024 | 462 | 557 |
| 2025 | 484 | 591 |
| 2026 | 356 | 418 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 37/321The radio frequency energy being inductively coupled to the plasma2,537
- H01J 37/32174Circuits specially adapted for controlling the rf discharge2,288
- H01J 37/32091The radio frequency energy being capacitively coupled to the plasma1,778
- H01J 37/32137Controlling of the discharge by modulation of energy1,443
- H01J 37/32128Using particular waveforms214
Recent patents
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,932 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,933 B2Trumpf Huettinger Sp. Z O. O.
- Pulsed voltage waveform with binary pulses for biasing of plasma6 Oct 2026US 12,755,934 B2APPLIED Materials.Inc.
- Process control for ion energy delivery using multiple generators and phase control6 Oct 2026US 12,755,935 B2Lam Research Corporation
- Apparatus and Method of Generating a Waveform8 Oct 2026US 2026/0311965 A1Eagle Harbor Technologies, Inc.
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Plasma processing apparatus, power source system, and plasma processing method8 Oct 2026US 2026/0311967 A1Tokyo Electron Limited
- Rf impedance matching network8 Oct 2026US 2026/0311968 A1ASM America, Inc.
- Monolithic modular high-frequency plasma source1 Oct 2026US 2026/0302134 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process777US 5,000,113 AAPPLIED Materials.Inc. · 1991
- Plasma uniformity control by gas diffuser hole design746US 8,083,853 B2APPLIED Materials.Inc. · 2011
- Temperature control system for semiconductor process chamber652US 6,015,465 AAPPLIED Materials.Inc. · 2000
- Plasma monitoring and control method and system625US 5,576,629 AFourth State Technology, Inc. · 1996
- Plasma enhanced chemical processing reactor and method593US 5,792,272 AWatkins-Johnson Company · 1998