H01J 37/32137
Controlling of the discharge by modulation of energy
Official title: {controlling of the discharge by modulation of energy}
H01J37/32137 (Controlling of the discharge by modulation of energy) appears on 1,443 US grants and 1,933 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,443
- Published applications
- 1,933
- Assignees
- 220
- Inventors
- 2,632
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 7 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 4 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 10 | 0 |
| 1995 | 6 | 0 |
| 1996 | 9 | 0 |
| 1997 | 7 | 0 |
| 1998 | 13 | 0 |
| 1999 | 8 | 0 |
| 2000 | 27 | 0 |
| 2001 | 19 | 13 |
| 2002 | 25 | 21 |
| 2003 | 17 | 19 |
| 2004 | 15 | 20 |
| 2005 | 13 | 23 |
| 2006 | 10 | 13 |
| 2007 | 7 | 42 |
| 2008 | 8 | 42 |
| 2009 | 9 | 31 |
| 2010 | 20 | 41 |
| 2011 | 24 | 54 |
| 2012 | 20 | 30 |
| 2013 | 33 | 52 |
| 2014 | 42 | 73 |
| 2015 | 42 | 91 |
| 2016 | 72 | 91 |
| 2017 | 88 | 114 |
| 2018 | 89 | 79 |
| 2019 | 94 | 96 |
| 2020 | 99 | 106 |
| 2021 | 66 | 109 |
| 2022 | 78 | 122 |
| 2023 | 92 | 161 |
| 2024 | 122 | 165 |
| 2025 | 124 | 192 |
| 2026 | 108 | 133 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,932 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,933 B2Trumpf Huettinger Sp. Z O. O.
- Pulsed voltage waveform with binary pulses for biasing of plasma6 Oct 2026US 12,755,934 B2APPLIED Materials.Inc.
- Process control for ion energy delivery using multiple generators and phase control6 Oct 2026US 12,755,935 B2Lam Research Corporation
- System and method for delivering pulsed RF power from a single generator to multiple loads6 Oct 2026US 12,755,936 B2Inspiring Atoms Pte Ltd
- Apparatus and Method of Generating a Waveform8 Oct 2026US 2026/0311965 A1Eagle Harbor Technologies, Inc.
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Methods and systems for plasma etching process1 Oct 2026US 2026/0302135 A1Tokyo Electron Limited
- Precise Feedback Control of Bias Voltage Tailored Waveform for Plasma Etch Processes1 Oct 2026US 2026/0302146 A1Lam Research Corporation
- Plasma potential adjustment circuit24 Sep 2026US 2026/0290752 A1Tokyo Electron Limited
Most cited
By later US patents
- Pulsed dual radio frequency CVD process568US 4,837,185 AIntel Corporation · 1989
- Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density523US 6,054,013 AAPPLIED Materials.Inc. · 2000
- Method for stabilizing plasma ignition523US 8,742,668 B2ASM IP Holdings B.V. · 2014
- Method of plasma-enhanced atomic layer etching521US 9,396,956 B1ASM IP Holding B. V. · 2016
- Methods for depositing silicon oxide501US 9,685,320 B2Lam Research Corporation · 2017