H01J 37/32146
Amplitude modulation, includes pulsing
Official title: {Amplitude modulation, includes pulsing}
H01J37/32146 (Amplitude modulation, includes pulsing) appears on 684 US grants and 1,000 published applications in this corpus.
Search patents in H01J- Granted patents
- 684
- Published applications
- 1,000
- Assignees
- 114
- Inventors
- 1,409
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 3 | 0 |
| 2000 | 7 | 0 |
| 2001 | 8 | 4 |
| 2002 | 11 | 8 |
| 2003 | 6 | 3 |
| 2004 | 5 | 5 |
| 2005 | 1 | 2 |
| 2006 | 2 | 0 |
| 2007 | 1 | 5 |
| 2008 | 0 | 4 |
| 2009 | 1 | 7 |
| 2010 | 3 | 13 |
| 2011 | 4 | 9 |
| 2012 | 3 | 7 |
| 2013 | 7 | 20 |
| 2014 | 15 | 33 |
| 2015 | 16 | 39 |
| 2016 | 31 | 46 |
| 2017 | 52 | 51 |
| 2018 | 35 | 34 |
| 2019 | 36 | 40 |
| 2020 | 44 | 61 |
| 2021 | 38 | 67 |
| 2022 | 44 | 79 |
| 2023 | 67 | 108 |
| 2024 | 72 | 113 |
| 2025 | 88 | 146 |
| 2026 | 73 | 96 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,932 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses6 Oct 2026US 12,755,933 B2Trumpf Huettinger Sp. Z O. O.
- Pulsed voltage waveform with binary pulses for biasing of plasma6 Oct 2026US 12,755,934 B2APPLIED Materials.Inc.
- System and method for delivering pulsed RF power from a single generator to multiple loads6 Oct 2026US 12,755,936 B2Inspiring Atoms Pte Ltd
- Plasma processing apparatus6 Oct 2026US 12,755,937 B2Tokyo Electron Limited
- Apparatus and Method of Generating a Waveform8 Oct 2026US 2026/0311965 A1Eagle Harbor Technologies, Inc.
- Methods and systems for plasma etching process1 Oct 2026US 2026/0302135 A1Tokyo Electron Limited
- Precise Feedback Control of Bias Voltage Tailored Waveform for Plasma Etch Processes1 Oct 2026US 2026/0302146 A1Lam Research Corporation
- Plasma potential adjustment circuit24 Sep 2026US 2026/0290752 A1Tokyo Electron Limited
- Systems and methods for achieving uniformity with multiple coils24 Sep 2026US 2026/0290770 A1Lam Research Corporation
Most cited
By later US patents
- Method of plasma-enhanced atomic layer etching521US 9,396,956 B1ASM IP Holding B. V. · 2016
- Method of atomic layer etching using functional group-containing fluorocarbon494US 9,735,024 B2ASM IP Holding B. V. · 2017
- Plasma-CVD method and apparatus493US 5,562,952 ANissin Electric Co., Ltd. · 1996
- Vacuum processing chamber having multi-mode access485US 6,095,083 AApplied Materiels, Inc. · 2000
- Method for controlling cyclic plasma-assisted process484US 8,790,743 B1ASM IP Holding B. V. · 2014