Plasma processing apparatus

A plasma processing apparatus comprising:

• a plasma processing chamber;
• a substrate support disposed within the plasma processing chamber;
• a high frequency power supply configured to generate high frequency power;
• an electrode or an antenna electrically connected to the high frequency power supply to receive the high frequency power for generating a plasma from a gas within the plasma processing chamber;
• a power consuming member disposed within the plasma processing chamber or the substrate support;
• an electricity storage unit electrically connected to the power consuming member;
• a power transmitting coil provided outside the plasma processing chamber;
• a power receiving coil electrically connected to the electricity storage unit and capable of receiving power from the power transmitting coil by electromagnetic induction coupling;
• at least one metal case that provides a shielded space and accommodates the power transmitting coil and the power receiving coil within the shielded space;
• and
• at least one ferrite material that is disposed within the shielded space and is provided to close a space in which the power transmitting coil and the power receiving coil are disposed.