H01J 37/32128
Using particular waveforms
Official title: {using particular waveforms, e.g. polarised waves}
H01J37/32128 (Using particular waveforms) appears on 214 US grants and 318 published applications in this corpus.
Search patents in H01J- Granted patents
- 214
- Published applications
- 318
- Assignees
- 54
- Inventors
- 433
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 3 |
| 2005 | 0 | 0 |
| 2006 | 3 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 3 |
| 2009 | 0 | 1 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 2 | 2 |
| 2013 | 0 | 4 |
| 2014 | 2 | 5 |
| 2015 | 4 | 5 |
| 2016 | 7 | 7 |
| 2017 | 11 | 12 |
| 2018 | 5 | 3 |
| 2019 | 10 | 16 |
| 2020 | 11 | 23 |
| 2021 | 14 | 24 |
| 2022 | 19 | 26 |
| 2023 | 30 | 41 |
| 2024 | 27 | 48 |
| 2025 | 35 | 57 |
| 2026 | 33 | 36 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Pulsed voltage waveform with binary pulses for biasing of plasma6 Oct 2026US 12,755,934 B2APPLIED Materials.Inc.
- Process control for ion energy delivery using multiple generators and phase control6 Oct 2026US 12,755,935 B2Lam Research Corporation
- Pulse-mode control in a bias supply29 Sep 2026US 12,749,652 B2Advanced Energy Industries, Inc.
- Efficient energy recovery in a nanosecond pulser circuit22 Sep 2026US 12,744,183 B2Eagle Harbor Technologies, Inc.
- Chamber impedance management in a processing chamber22 Sep 2026US 12,744,185 B2APPLIED Materials.Inc.
- Apparatus and Method of Generating a Waveform8 Oct 2026US 2026/0311965 A1Eagle Harbor Technologies, Inc.
- Matchless RF Plasma Systems for Capacitively Coupled Plasmas17 Sep 2026US 2026/0279727 A1Eagle Harbor Technologies, Inc.
- Voltage waveform controlling method, substrate processing method, and substrate processing apparatus17 Sep 2026US 2026/0279728 A1Samsung Electronics Co., Ltd.
- High Frequency RF Generator and DC Pulsing17 Sep 2026US 2026/0279729 A1Eagle Harbor Technologies, Inc.
- Power supply system, plasma processing apparatus, and control method10 Sep 2026US 2026/0269183 A1Tokyo Electron Limited
Most cited
By later US patents
- Systems and methods for reverse pulsing100US 9,583,357 B1Lam Research Corporation · 2017
- Systems and methods for reverse pulsing96US 9,761,459 B2Lam Research Corporation · 2017
- Smart multi-level RF pulsing methods88US 9,872,373 B1APPLIED Materials.Inc. · 2018
- Arbitarary waveform generation using nanosecond pulses79US 10,304,661 B2Eagle Harbor Technologies, Inc. · 2019
- Nanosecond pulser ADC system76US 10,659,019 B2Eagle Harbor Technologies, Inc. · 2020