Systems and methods for reverse pulsing

A method comprising:

• receiving a digital signal periodically transitioning between a first state and a second state;
• and
• providing a first radio frequency (RF) pulsed signal to a top coil electrode associated with a plasma chamber and a second RF pulsed signal to a bottom electrode of the plasma chamber, wherein said providing the first RF pulsed signal includes synchronizing based on the digital signal a high state of the first RF pulsed signal with a low state of the second RF pulsed signal and a low state of the first RF pulsed signal with a high state of the second RF pulsed signal, wherein synchronizing based on the digital signal includes transitioning the second RF pulsed signal from the low state to the high state at a time of transition of the first RF pulsed signal from the high state to the low state and transitioning the second RF pulsed signal from the high state to the low state at a time of transition of the first RF pulsed signal from the low state to the high state, wherein said transitioning the second RF pulsed signal from the low state to the high state at the time of transition of the first RF pulsed signal from the high state to the low state is performed during a conductor etch to control directionality of ions within plasma and to reduce a temperature of electrons within the plasma, wherein the high state of the first RF pulsed signal has a greater amount of power than the low state of the first RF pulsed signal, wherein the high state of the second RF pulsed signal has a greater amount of power than the low state of the second RF pulsed signal.