US 2026/0279727 A1 · Matchless RF Plasma Systems for Capacitively Coupled Plasmas

Abstract

A matchless RF generator is disclosed that does not require a matching network (or the like) between the RF generator and the plasma. Plasmas have variable inductance or capacitance value during the plasma life cycle. For example, prior to ignition, the plasma chamber may have a first inductance and/or a first capacitance; during ignition, the plasma chamber may have a second inductance and/or a second capacitance; while the plasma is active, the plasma chamber with the plasma may have a third inductance and/or a third capacitance; and during a change in the plasma density, plasma chemistry, plasma brightness, constituent flow rate, plasma voltage, and plasma electric field the plasma chamber with the plasma may have a fourth inductance and/or fourth capacitance.

Claims20

Dependent claims

A plasma system comprising:

a capacitively coupled plasma chamber;
an RF generator comprising a plurality of switches that is coupled with the capacitively coupled plasma chamber, the RF generator produces a voltage waveform to the capacitively coupled plasma chamber at a frequency that is substantially similar to a resonant frequency;
resonant elements electrically coupled with the RF generator and the capacitively coupled plasma chamber, the resonant elements having a reactance;
and
a controller electrically coupled with the plurality of switches and configured to control the operation of the switches to produce the voltage waveform;
wherein the resonant frequency is a function of at least the reactance and the plasma reactance;
wherein the voltage waveform has an RF amplitude and an RF frequency that is substantially the resonant frequency.

4 more elements

Dependencies are inferred from the claim text.

Matchless RF Plasma Systems for Capacitively Coupled Plasmas

Life of this patent

Matchless RF Plasma Systems for Capacitively Coupled Plasmas

Life of this patent

Abstract

Claims20