G03F 1/70
Adapting basic layout or design of masks to lithographic process requirements
Official title: Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
G03F1/70 (Adapting basic layout or design of masks to lithographic process requirements) appears on 1,352 US grants and 1,466 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,352
- Published applications
- 1,466
- Assignees
- 255
- Inventors
- 2,263
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 5 | 0 |
| 1995 | 8 | 0 |
| 1996 | 3 | 0 |
| 1997 | 5 | 0 |
| 1998 | 12 | 0 |
| 1999 | 6 | 0 |
| 2000 | 5 | 0 |
| 2001 | 7 | 4 |
| 2002 | 20 | 41 |
| 2003 | 39 | 45 |
| 2004 | 38 | 48 |
| 2005 | 26 | 46 |
| 2006 | 26 | 35 |
| 2007 | 18 | 43 |
| 2008 | 30 | 48 |
| 2009 | 32 | 45 |
| 2010 | 59 | 50 |
| 2011 | 48 | 46 |
| 2012 | 63 | 84 |
| 2013 | 111 | 90 |
| 2014 | 95 | 84 |
| 2015 | 72 | 69 |
| 2016 | 72 | 65 |
| 2017 | 49 | 46 |
| 2018 | 54 | 51 |
| 2019 | 52 | 55 |
| 2020 | 73 | 62 |
| 2021 | 61 | 79 |
| 2022 | 46 | 79 |
| 2023 | 64 | 91 |
| 2024 | 50 | 60 |
| 2025 | 63 | 58 |
| 2026 | 38 | 42 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Method of manufacturing extreme ultraviolet (EUV) mask for forming semiconductor memory device15 Sep 2026US 12,736,868 B2Samsung Electronics Co., Ltd.
- Kernel function generation method, optical proximity correction method using the kernel function, and mask manufacturing method including the optical proximity correction method8 Oct 2026US 2026/0310064 A1Samsung Electronics Co., Ltd.
- Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern8 Oct 2026US 2026/0310065 A1ASML Netherlands B. V.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Reflective photomask and method for manufacturing reflective photomask1 Oct 2026US 2026/0299398 A1Rapidus Corporation
- Reticle design for minimizing thermal strain1 Oct 2026US 2026/0299401 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method for integrated circuit mask patterning449US 9,256,709 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Method of generating a bias-adjusted layout design of a conductive feature and method of generating a simulation model of a predefined fabrication process418US 8,887,106 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Method utilizing compensation features in semiconductor processing379US 7,202,148 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2007
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999
- Process window based optical proximity correction of lithographic images244US 6,578,190 B2International Business Machines Corporation · 2003