Reflective photomask and method for manufacturing reflective photomask

A method for manufacturing a reflective photomask that includes a first portion that is doubly exposed when a predetermined pattern is transferred using exposure light, and a second portion other than the first portion,

• the method comprising:
• a step of forming, on the substrate, a reflector that reflects the exposure light;
• a step of forming, on the reflector, an absorption film that absorbs the exposure light;
• a step of forming the pattern by partially removing the absorption film;
• and
• a step of making a first reflectance lower than a second reflectance, the first reflectance being a reflectance of the exposure light by a first exposed portion exposed in an opening of the pattern in the first portion in the reflector, the second reflectance being a reflectance of the exposure light by a second exposed portion exposed in an opening of the pattern in the second portion in the reflector.

A method for manufacturing a reflective photomask that includes a first portion that is doubly exposed when a predetermined pattern is transferred using exposure light, and a second portion other than the first portion,

• the method comprising:
• a step of forming, on the substrate, a reflector that reflects the exposure light;
• a step of forming, on the reflector, an absorption film that absorbs the exposure light;
• and
• a step that is a step of forming the pattern by partially removing the absorption film, and is a step of making a first reflectance lower than a second reflectance, the first reflectance being a reflectance of the exposure light by a first exposed portion exposed in an opening of the pattern in the first portion in the reflector, the second reflectance being a reflectance of the exposure light by a second exposed portion exposed in an opening of the pattern in the second portion in the reflector.