G03F 1/68
Preparation processes not covered by groups g03f1/20 - g03f1/50
Official title: Preparation processes not covered by groups G03F1/20 - G03F1/50
G03F1/68 (Preparation processes not covered by groups g03f1/20 - g03f1/50) appears on 4,900 US grants and 5,215 published applications in this corpus.
Search patents in G03F- Granted patents
- 4,900
- Published applications
- 5,215
- Assignees
- 793
- Inventors
- 7,506
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 3 | 0 |
| 1978 | 8 | 0 |
| 1979 | 6 | 0 |
| 1980 | 10 | 0 |
| 1981 | 6 | 0 |
| 1982 | 6 | 0 |
| 1983 | 9 | 0 |
| 1984 | 8 | 0 |
| 1985 | 9 | 0 |
| 1986 | 19 | 0 |
| 1987 | 12 | 0 |
| 1988 | 17 | 0 |
| 1989 | 17 | 0 |
| 1990 | 30 | 0 |
| 1991 | 14 | 0 |
| 1992 | 20 | 0 |
| 1993 | 21 | 0 |
| 1994 | 24 | 0 |
| 1995 | 31 | 0 |
| 1996 | 30 | 0 |
| 1997 | 31 | 0 |
| 1998 | 52 | 0 |
| 1999 | 52 | 0 |
| 2000 | 74 | 0 |
| 2001 | 63 | 40 |
| 2002 | 110 | 158 |
| 2003 | 146 | 185 |
| 2004 | 142 | 195 |
| 2005 | 126 | 200 |
| 2006 | 158 | 201 |
| 2007 | 119 | 220 |
| 2008 | 137 | 248 |
| 2009 | 154 | 217 |
| 2010 | 231 | 212 |
| 2011 | 212 | 181 |
| 2012 | 211 | 216 |
| 2013 | 236 | 220 |
| 2014 | 233 | 217 |
| 2015 | 202 | 214 |
| 2016 | 195 | 186 |
| 2017 | 184 | 178 |
| 2018 | 170 | 191 |
| 2019 | 158 | 190 |
| 2020 | 208 | 214 |
| 2021 | 191 | 220 |
| 2022 | 163 | 236 |
| 2023 | 188 | 281 |
| 2024 | 172 | 239 |
| 2025 | 163 | 203 |
| 2026 | 113 | 153 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Euv photomask and manufacturing method thereof8 Oct 2026US 2026/0310060 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Kernel function generation method, optical proximity correction method using the kernel function, and mask manufacturing method including the optical proximity correction method8 Oct 2026US 2026/0310064 A1Samsung Electronics Co., Ltd.
- Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern8 Oct 2026US 2026/0310065 A1ASML Netherlands B. V.
- Reflective mask blank, reflective mask, reflective mask blank producing method, and reflective mask producing method8 Oct 2026US 2026/0310066 A1AGC Inc.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
Most cited
By later US patents
- Semiconductor substrate process using an optically writable carbon-containing mask539US 7,429,532 B2APPLIED Materials.Inc. · 2008
- Etching of nano-imprint templates using an etch reactor522US 7,955,516 B2APPLIED Materials.Inc. · 2011
- Method for integrated circuit mask patterning449US 9,256,709 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Method and system for mask fabrication process control446US 7,260,442 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2007
- Method of generating a bias-adjusted layout design of a conductive feature and method of generating a simulation model of a predefined fabrication process418US 8,887,106 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014