G03F 1/76
Patterning of masks by imaging
G03F1/76 (Patterning of masks by imaging) appears on 557 US grants and 621 published applications in this corpus.
Search patents in G03F- Granted patents
- 557
- Published applications
- 621
- Assignees
- 183
- Inventors
- 1,034
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 4 | 0 |
| 2000 | 7 | 0 |
| 2001 | 11 | 5 |
| 2002 | 11 | 13 |
| 2003 | 18 | 22 |
| 2004 | 16 | 21 |
| 2005 | 12 | 22 |
| 2006 | 16 | 11 |
| 2007 | 13 | 17 |
| 2008 | 8 | 18 |
| 2009 | 9 | 15 |
| 2010 | 30 | 32 |
| 2011 | 24 | 21 |
| 2012 | 19 | 36 |
| 2013 | 36 | 31 |
| 2014 | 25 | 31 |
| 2015 | 27 | 37 |
| 2016 | 32 | 36 |
| 2017 | 30 | 31 |
| 2018 | 28 | 38 |
| 2019 | 35 | 26 |
| 2020 | 30 | 23 |
| 2021 | 17 | 23 |
| 2022 | 17 | 25 |
| 2023 | 15 | 33 |
| 2024 | 14 | 27 |
| 2025 | 22 | 22 |
| 2026 | 7 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Optical elements patterning21 Jul 2026US 12,687,776 B2Tel Manufacturing and Engineering of America, Inc.
- Mask process correction methods and methods of fabricating lithographic masks using the same14 Jul 2026US 12,681,378 B2Samsung Electronics Co., Ltd.
- Mask process correction methods and methods of fabricating lithographic masks using the same26 May 2026US 12,638,765 B2Samsung Electronics Co., Ltd.
- Photomask and method for inspecting photomask21 Apr 2026US 12,607,927 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate treating apparatus and substrate treating method24 Feb 2026US 12,560,862 B2Semes Co., Ltd.
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method of manufacturing semiconductor device10 Sep 2026US 2026/0267221 A1Samsung Electronics Co., Ltd.
- Mask for euv lithography11 Jun 2026US 2026/0161069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Photomask having recessed region7 May 2026US 2026/0126719 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Chemically amplified positive resist composition and resist pattern forming process19 Mar 2026US 2026/0079400 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Vacuum-integrated hardmask processes and apparatus389US 9,778,561 B2Lam Research Corporation · 2017
- Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity133US 9,618,837 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2017
- System and method for reducing patterning variability in integrated circuit manufacturing through mask layout corrections132US 7,318,214 B1Invarium, Inc. · 2008
- Three-dimensional mask model for photolithography simulation85US 7,703,069 B1Brion Technologies, Inc. · 2010
- Method for manufacturing a surface and integrated circuit using variable shaped beam lithography76US 7,754,401 B2D2S, Inc. · 2010