G03F 1/78
By charged particle beam [cpb]
Official title: by charged particle beam [CPB], e.g. electron beam patterning of masks
G03F1/78 (By charged particle beam [cpb]) appears on 382 US grants and 400 published applications in this corpus.
Search patents in G03F- Granted patents
- 382
- Published applications
- 400
- Assignees
- 122
- Inventors
- 631
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 4 | 0 |
| 2001 | 9 | 3 |
| 2002 | 9 | 9 |
| 2003 | 15 | 17 |
| 2004 | 11 | 16 |
| 2005 | 10 | 17 |
| 2006 | 14 | 10 |
| 2007 | 11 | 15 |
| 2008 | 4 | 15 |
| 2009 | 9 | 13 |
| 2010 | 25 | 29 |
| 2011 | 22 | 20 |
| 2012 | 18 | 24 |
| 2013 | 28 | 20 |
| 2014 | 14 | 16 |
| 2015 | 15 | 19 |
| 2016 | 17 | 17 |
| 2017 | 13 | 18 |
| 2018 | 18 | 22 |
| 2019 | 19 | 15 |
| 2020 | 16 | 16 |
| 2021 | 11 | 14 |
| 2022 | 12 | 9 |
| 2023 | 8 | 22 |
| 2024 | 12 | 13 |
| 2025 | 14 | 9 |
| 2026 | 5 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optical elements patterning21 Jul 2026US 12,687,776 B2Tel Manufacturing and Engineering of America, Inc.
- Mask process correction methods and methods of fabricating lithographic masks using the same14 Jul 2026US 12,681,378 B2Samsung Electronics Co., Ltd.
- Mask process correction methods and methods of fabricating lithographic masks using the same26 May 2026US 12,638,765 B2Samsung Electronics Co., Ltd.
- Substrate treating apparatus and substrate treating method24 Feb 2026US 12,560,862 B2Semes Co., Ltd.
- Method and apparatus for setting a side wall angle of a pattern element of a photolithographic mask27 Jan 2026US 12,535,726 B2Carl Zeiss SMT GmbH
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Chemically amplified positive resist composition and resist pattern forming process19 Mar 2026US 2026/0079400 A1Shin-Etsu Chemical Co., Ltd.
- Creating an electric field when processing a lithography object25 Dec 2025US 2025/0391632 A1
- Methods and systems to determine shapes for semiconductor or flat panel display fabrication13 Nov 2025US 2025/0347990 A1D2S, Inc.
- Reflective photomask blank, and method for manufacturing reflective photomask23 Oct 2025US 2025/0328069 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Method for manufacturing a surface and integrated circuit using variable shaped beam lithography76US 7,754,401 B2D2S, Inc. · 2010
- Method and system for design of a reticle to be manufactured using variable shaped beam lithography61US 7,901,850 B2D2S, Inc. · 2011
- Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography and recording medium in which the method is recorded53US 6,291,119 B1Samsung Electronics Co., Ltd. · 2001
- Composition for underlying film and method of forming a pattern using the film49US 6,054,254 AKabushiki Kaisha Toshiba · 2000
- Method and system for context-specific mask writing46US 7,302,672 B2Cadence Design Systems, Inc. · 2007