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US 7,302,672 B2Granted
Method and system for context-specific mask writing
AssigneeCadence Design Systems, Inc.
InventorsRobert C. Pack, Louis Scheffer
Life of this patent
Estimating the term…
Abstract
A method for generating lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.
Claims24
A method for writing a mask, comprising:
- determining electronic properties of features in the mask;
- determining physical geometric properties of features in the mask;
- determining manufacturing properties for features in the mask, wherein design data comprises the electronic, physical, and manufacturing properties;
- analyzing the design data;
- configuring the design data to reflect the analysis determining one or more appropriate shapes or energy levels for a beam for writing the elements based on the design data;
- and
- writing the features of the mask based on the analyzed design data using the one or more appropriate shapes or energy levels for the beam.
4 more elements
A system for writing a mask, comprising:
- means for determining electronic properties of features in the mask;
- means for determining physical geometric properties of features in the mask;
- means for determining manufacturing properties for features in the mask, wherein design data comprises the electronic, physical, and manufacturing properties
- means for analyzing the design data;
- means for configuring the design data to reflect the analysis;
- means for determining one or more appropriate shapes or energy levels for a beam for writing the elements based on the design data;
- and
- means for writing the features of the mask based on the analyzed design data using the one or more appropriate shapes or energy levels for the beam.
5 more elements
A computer program product embodied on computer readable medium, the computer readable medium having stored thereon a sequence of instructions which, when executed by a processor, causes the processor to execute a method for writing a mask, the method comprising:
- determining electronic properties of features in the mask;
- determining physical geometric properties of features in the mask;
- determining manufacturing properties for features in the mask, wherein design data comprises the electronic, physical, and manufacturing properties;
- analyzing the design data;
- configuring the design data to reflect the analysis;
- determining one or more appropriate shapes or energy levels for a beam for writing the elements based on the design data;
- and
- writing the features of the mask based on the analyzed design data using the one ore more appropriate shapes or energy levels for the beam.
5 more elements
Dependencies are inferred from the claim text.