G03F 1/72
Repair or correction of mask defects
G03F1/72 (Repair or correction of mask defects) appears on 629 US grants and 604 published applications in this corpus.
Search patents in G03F- Granted patents
- 629
- Published applications
- 604
- Assignees
- 195
- Inventors
- 1,204
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 3 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 4 | 0 |
| 1988 | 7 | 0 |
| 1989 | 6 | 0 |
| 1990 | 10 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 6 | 0 |
| 1994 | 9 | 0 |
| 1995 | 11 | 0 |
| 1996 | 10 | 0 |
| 1997 | 7 | 0 |
| 1998 | 9 | 0 |
| 1999 | 13 | 0 |
| 2000 | 26 | 0 |
| 2001 | 16 | 9 |
| 2002 | 17 | 21 |
| 2003 | 24 | 31 |
| 2004 | 19 | 24 |
| 2005 | 18 | 32 |
| 2006 | 20 | 27 |
| 2007 | 21 | 14 |
| 2008 | 11 | 31 |
| 2009 | 18 | 19 |
| 2010 | 28 | 26 |
| 2011 | 18 | 12 |
| 2012 | 13 | 18 |
| 2013 | 17 | 17 |
| 2014 | 25 | 33 |
| 2015 | 21 | 28 |
| 2016 | 23 | 21 |
| 2017 | 30 | 20 |
| 2018 | 18 | 21 |
| 2019 | 14 | 20 |
| 2020 | 20 | 20 |
| 2021 | 18 | 23 |
| 2022 | 14 | 16 |
| 2023 | 12 | 34 |
| 2024 | 16 | 32 |
| 2025 | 14 | 31 |
| 2026 | 23 | 24 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- End point determination by means of contrast gas29 Sep 2026US 12,748,347 B2Carl Zeiss SMT GmbH
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- System, method and program product for photomask surface treatment8 Oct 2026US 2026/0310068 A1Photronics, Inc.
- Photomask and method of manufacturing or repairing photomask1 Oct 2026US 2026/0299399 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography exposure system and lithography method using the same17 Sep 2026US 2026/0277115 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Sub-resolution assist feature generating method, and mask manufacturing method including the generating method13 Aug 2026US 2026/0235946 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof133US 9,869,928 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Feedback method to repair phase shift masks114US 6,016,357 AInternational Business Machines Corporation · 2000
- Electron beam processing98US 6,753,538 B2FEI Company · 2004
- Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed beam90US 6,333,485 B1International Business Machines Corporation · 2001
- Object inspection and/or modification system and method89US 6,337,479 B12002