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US 2026/0310068 A1Published application
System, method and program product for photomask surface treatment
AssigneePhotronics, Inc.
InventorsChristopher Progler, Young Mog Ham
Life of this patent
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Abstract
A method of manufacturing a photomask including the steps of providing a photomask blank, inspecting the photomask blank to determine presence of one or more defects in the photomask blank, wherein the one or more defects comprise one or more photomask substrate defects, and compensating for the one or more photomask substrate defects by roughening one or more surface portions of the photomask substrate.
Claims13
A system for manufacturing a photomask, comprising:
- one or more processors, a non-transitory computer-readable memory operatively connected to the one or more processors, the non-transitory computer-readable memory having machine-readable instructions stored thereon, the machine-readable instructions, when executed by the one or more processors, causing the one or more processors to perform the following steps:
- (A) inspecting a photomask blank comprising a glass substrate to determine the presence of one or more defects in the glass substrate;
- and
- (B) performing a photolithographic process using a photomask made from the photomask blank, the photolithographic process comprising compensating for the one or more defects by roughening one or more surface portions of the glass substrate, the roughened one or more surface portions configured to remain on the glass substrate and scramble directionality of an optical beam transmitted through the glass substrate during the photolithographic process.
1 more element
Dependencies are inferred from the claim text.