Feedback method to repair phase shift masks

A method of repairing a semiconductor phase shift mask comprising the steps of:

• a) providing a semiconductor phase shift mask having a defect;
• b) illuminating said mask to create an aerial image of said mask;
• c) analyzing said aerial image of said mask;
• d) detecting said defect in said mask from said aerial image;
• e) providing a look-up table having information on patch properties;
• f) determining unique attenuating patch parameters for repairing said mask defect utilizing the aerial image analysis and information from said look-up table;
• and
• g) applying to said mask an attenuating patch corresponding to said parameters to repair said mask defect.

A method of repairing a semiconductor phase shift mask comprising the steps of:

• a) providing a semiconductor phase shift mask having a defect;
• b) illuminating said mask to create an aerial image of said mask;
• c) analyzing said aerial image of said mask including degree of transmission and degree of phase shift of said mask;
• d) detecting said defect in said mask from said aerial image;
• e) providing a look-up table having information on mask material properties;
• f) determining unique parameters for repairing said mask defect utilizing the aerial image analysis including degree of transmission and degree of phase shift of a repair;
• and
• g) removing a predetermined amount of material from said mask in accordance with said parameters to correct said mask defect.

An apparatus for repairing a semiconductor mask comprising:

• means for illuminating a semiconductor mask having a defect to create an aerial image of said mask;
• means for analyzing said aerial image of said mask including degree of transmission and degree of phase shift of said mask;
• means for detecting said defect in said mask from said aerial image;
• means for determining unique parameters for repairing said mask defect utilizing the aerial image analysis including degree of transmission and degree of phase shift of a repair;
• and
• means for repairing said mask in accordance with said parameters to correct said mask defect.

A method of repairing a semiconductor mask comprising the steps of:

• a) providing a semiconductor mask having a defect;
• b) illuminating said mask to create an aerial image of said mask;
• c) analyzing said aerial image of said mask;
• d) detecting said defect in said mask from said aerial image;
• e) providing a look-up table having information on patch properties as a function of material deposition parameters;
• f) determining unique parameters for repairing said mask defect utilizing the aerial image analysis and information from said look-up table;
• and
• g) repairing said mask in accordance with said parameters to correct said mask defect by applying a patch of an attenuated material to said mask.

An apparatus for repairing a semiconductor mask comprising:

• means for illuminating a semiconductor mask having a defect to create an aerial image of said mask;
• means for analyzing said aerial image of said mask;
• means for detecting said defect in said mask from said aerial image;
• a look-up table having information on patch properties as a function of material deposition parameters;
• means for determining unique parameters for repairing said mask defect utilizing the aerial image analysis, the determining means including means for utilizing information from said look-up table;
• and
• means for repairing said mask in accordance with said parameters to correct said mask defect.

A method of repairing a semiconductor phase shift mask comprising the steps of:

• a) providing a semiconductor phase shift mask having a defect;
• b) illuminating said mask to create an aerial image of said mask;
• c) analyzing said aerial image of said mask;
• d) detecting said defect in said mask from said aerial image;
• e) providing a look-up table having information on mask material properties;
• f) determining unique parameters for repairing said mask defect utilizing the aerial image analysis and information from said look-up table;
• and
• g) removing a predetermined amount of material from said mask in accordance with said parameters to correct said mask defect.