G03F 1/74
By charged particle beam [cpb]
Official title: by charged particle beam [CPB], e.g. focused ion beam
G03F1/74 (By charged particle beam [cpb]) appears on 201 US grants and 185 published applications in this corpus.
Search patents in G03F- Granted patents
- 201
- Published applications
- 185
- Assignees
- 85
- Inventors
- 437
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 5 | 0 |
| 1990 | 9 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 5 | 0 |
| 1997 | 1 | 0 |
| 1998 | 4 | 0 |
| 1999 | 6 | 0 |
| 2000 | 12 | 0 |
| 2001 | 5 | 3 |
| 2002 | 10 | 7 |
| 2003 | 8 | 10 |
| 2004 | 9 | 11 |
| 2005 | 4 | 9 |
| 2006 | 6 | 5 |
| 2007 | 8 | 5 |
| 2008 | 3 | 7 |
| 2009 | 6 | 5 |
| 2010 | 6 | 8 |
| 2011 | 5 | 3 |
| 2012 | 4 | 6 |
| 2013 | 5 | 3 |
| 2014 | 5 | 9 |
| 2015 | 7 | 4 |
| 2016 | 3 | 6 |
| 2017 | 7 | 4 |
| 2018 | 5 | 4 |
| 2019 | 4 | 5 |
| 2020 | 3 | 8 |
| 2021 | 4 | 3 |
| 2022 | 4 | 3 |
| 2023 | 2 | 18 |
| 2024 | 5 | 17 |
| 2025 | 4 | 11 |
| 2026 | 8 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- End point determination by means of contrast gas29 Sep 2026US 12,748,347 B2Carl Zeiss SMT GmbH
- Method and apparatus for processing a lithographic mask7 Jul 2026US 12,675,042 B2Carl Zeiss SMT GmbH
- Method for particle beam-induced processing of a defect of a microlithographic photomask7 Jul 2026US 12,676,283 B2Carl Zeiss SMT GmbH
- Apparatus and methods for three dimensional reticle defect smart repair23 Jun 2026US 12,666,928 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Repair method for photomask defects19 May 2026US 12,631,957 B2Intel Corporation
- Stabilization of a repaired region of an object for lithography13 Aug 2026US 2026/0235947 A1
- Method for removing defect23 Jul 2026US 2026/0211314 A1Samsung Electronics Co., Ltd.
- Method and device for mask repair23 Jul 2026US 2026/0211315 A1
- Method and apparatus for particle beam-induced etching of a defect of a microlithographic photomask16 Jul 2026US 2026/0202738 A1
- Method for particle beam-induced processing of a defect of a microlithographic photomask16 Jul 2026US 2026/0204510 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Electron beam processing98US 6,753,538 B2FEI Company · 2004
- Ion beam processing apparatus and method of correcting mask defects77US 4,503,329 AHitachi, Ltd. · 1985
- Method and apparatus for correcting delicate wiring of IC device69US 4,609,809 AHitachi, Ltd. · 1986
- Pattern film repair using a focused particle beam system67US 6,042,738 AMicrion Corporation · 2000
- Method of repairing defect of structure56US 5,429,730 AKabushiki Kaisha Toshiba · 1995