Stabilization of a repaired region of an object for lithography
OwnerDaniel Rhinow, Gerson Mette +8inventors
InventorsDaniel Rhinow, Gerson Mette, Benjamin Herd, Laura Ahmels, Hubertus Marbach, Christian Preischl, Bartholomaeus Szafranek, Patrick Salg, Eva Wirth, Tim Hadler
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Abstract
The present invention relates inter alia to a method of passivating a repair region of a lithography mask, wherein the method comprises a) feeding in a passivation gas and b) directing a particle beam onto a passivation region of the mask, wherein the passivation region has at least one section outside the repair region.
Claims31
A method of passivating a repair region of a lithography mask, comprising:
- a) feeding in a passivation gas;
- and
- b) directing a particle beam onto a passivation region of the mask, where the passivation region has at least one section outside the repair region.
A method of repairing a lithography mask, comprising:
- a) particle beam-based repair of a defect in a repair region of the mask in the presence of a repair gas;
- b) subsequent passivating of the repair region in a passivation region in the presence of a passivation gas, wherein the passivating is preferably effected in a particle beam-based manner.
A device for passivating a repair region of a lithography mask, comprising:
- a) means of feeding in a passivation gas;
- and
- b) means of directing a particle beam onto a passivation region, where the passivation region has at least one section outside the repair region.
A device for repairing a lithography mask, comprising:
- a) means of particle beam-based repair of a defect in a repair region of the mask in the presence of a repair gas;
- and
- b) means of subsequently passivating the repair region in a passivation region and in the presence of a passivation gas, wherein the passivating is preferably effected in a particle beam-based manner.
Dependencies are inferred from the claim text.