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US 12,675,042 B2Granted
Method and apparatus for processing a lithographic mask
AssigneeCarl Zeiss SMT GmbH
InventorsDaniel Rhinow, Bartholomaeus Szafranek, Joachim Welte
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Abstract
Methods for repairing a defect of a lithographic mask with a particle beam are described. One such method can comprise the following steps: Processing the defect with the particle beam with a first set of processing parameters; processing the defect with the particle beam with a second set of processing parameters; wherein at least one parameter from the first set of processing parameters differs from the second set of processing parameters.
Claims20
A method for repairing a defect of a photolithographic mask with a particle beam, comprising:
- a. processing the defect of the photolithographic mask with the particle beam with a first set of processing parameters;
- and
- b. processing the defect of the photolithographic mask with the particle beam with a second set of processing parameters;
- c. wherein at least one parameter from the first set of processing parameters differs from the second set of processing parameters;
- d. wherein at least one marginal pixel of the defect of the photolithographic mask is processed with the first set of processing parameters and at least one non-marginal pixel of the defect of the photolithographic mask is processed with the second set of processing parameters.
2 more elements
A method comprising:
- repairing a defect of a photolithographic mask with a particle beam, comprising:
- processing at least one marginal pixel of the defect of the photolithographic mask with the particle beam with a first set of processing parameters with a higher precision and a slower speed;
- and
- processing at least one non-marginal pixel of the defect of the photolithographic mask with the particle beam with a second set of processing parameters with a lower precision and a higher speed;
- wherein at least one parameter from the first set of processing parameters differs from the second set of processing parameters.
2 more elements
Dependencies are inferred from the claim text.