Method and device for mask repair
OwnerChristian Felix Hermanns, Christian Rensing +2inventors
InventorsChristian Felix Hermanns, Christian Rensing, Thorsten Hofmann, Gerson Mette
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Abstract
The present invention relates to a method for repairing a defect of a cap layer of a mask for lithography. The method comprises the step of depositing a deposition material on at least a portion of the cap layer and/or a multilayer of the mask, such that at least the defect of the cap layer is covered by the deposition material.
Claims25
A method for repairing a defect of a cap layer of a mask for lithography, comprising depositing a deposition material on at least a portion of the cap layer and/or a multilayer of the mask, such that at least the defect of the cap layer is covered by the deposition material, wherein a lateral extension of the deposited deposition material exceeds a lateral extension associated with the defect of the cap layer.
A device for repairing a defect of a cap layer of a mask for lithography, comprising:
- means for obtaining a characterization of the defect of the cap layer of the mask;
- and
- means for automatically depositing a deposition material on at least a portion of the cap layer and/or a multilayer of the mask, such that at least the defect of the cap layer is covered by the deposition material.
Dependencies are inferred from the claim text.