G03F 1/80
Etching
G03F1/80 (Etching) appears on 524 US grants and 665 published applications in this corpus.
Search patents in G03F- Granted patents
- 524
- Published applications
- 665
- Assignees
- 144
- Inventors
- 1,093
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 3 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 4 | 2 |
| 2002 | 8 | 10 |
| 2003 | 7 | 13 |
| 2004 | 11 | 13 |
| 2005 | 10 | 12 |
| 2006 | 13 | 17 |
| 2007 | 3 | 21 |
| 2008 | 9 | 33 |
| 2009 | 7 | 22 |
| 2010 | 24 | 18 |
| 2011 | 23 | 19 |
| 2012 | 20 | 14 |
| 2013 | 12 | 22 |
| 2014 | 20 | 18 |
| 2015 | 27 | 27 |
| 2016 | 24 | 31 |
| 2017 | 28 | 39 |
| 2018 | 27 | 31 |
| 2019 | 31 | 45 |
| 2020 | 38 | 33 |
| 2021 | 32 | 37 |
| 2022 | 29 | 37 |
| 2023 | 25 | 44 |
| 2024 | 26 | 52 |
| 2025 | 18 | 30 |
| 2026 | 20 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Method of manufacturing extreme ultraviolet (EUV) mask for forming semiconductor memory device15 Sep 2026US 12,736,868 B2Samsung Electronics Co., Ltd.
- Process method for improving SRAM operating speed15 Sep 2026US 12,740,038 B2Shanghai Huali Integrated Circuit Corporation
- Process proximity effect correction method and process proximity effect correction device25 Aug 2026US 12,717,225 B2Samsung Electronics Co., Ltd.
- Photomask including line pattern monitoring mark and method of manufacturing integrated circuit device using the same18 Aug 2026US 12,710,693 B2Samsung Electronics Co., Ltd.
- Euv photomask and manufacturing method thereof8 Oct 2026US 2026/0310060 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for smoother tonal response in flexographic printing17 Sep 2026US 2026/0273977 A1Esko Software BV
- Method for manufacturing semiconductor structure using multi-layered hard mask10 Sep 2026US 2026/0271679 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Meta-optical device and method of manufacturing metasurface27 Aug 2026US 2026/0251819 A1Research & Business Foundation Sungkyunkwan University
- Substrate processing method, substrate processing apparatus, and method for manufacturing original plate6 Aug 2026US 2026/0227690 A1
Most cited
By later US patents
- Etching of nano-imprint templates using an etch reactor522US 7,955,516 B2APPLIED Materials.Inc. · 2011
- Process for etching a metal layer suitable for use in photomask fabrication180US 7,682,518 B2APPLIED Materials.Inc. · 2010
- Method and apparatus for reducing loading effects on a semiconductor manufacturing component during an etch process160US 6,703,170 B1DuPont Photomasks, Inc. · 2004
- Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof133US 9,869,928 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Method of fabricating a lithography mask85US 8,679,707 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014